Abstract:SWhile predicting and removing of lithographic hot-spots are a matured practice in recent semiconductor industry, it is one of the most difficult challenges to achieve high quality detection coverage and to provide designer-friendly fixing guidance for effective physical design implementation. In this paper, we present an accurate hot-spot detection method through leveling and scoring algorithm using weighted combination of image quality parameters, i.e., normalized image log-slope (NILS), mask error enhanceme… Show more
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