Scattering of Electrons by C, N, O,N+,O+, and

Abstract

The formulation given by Smith et al., for transitions induced by electron impact among ground-state terms of atoms or ions with configurations 2p$ or 3pQ, is corrected. Closecoupling equations are solved numerically for electrons incident on C, N, O, N + , 0 + , and 0 ++ . Shape resonances are found in low-energy elastic scattering by ground-state carbon and nitrogen atoms. Peaks in electron-atom inelastic cross sections are found to occur at lower energies than those calculated by Smith et al., and the magnitude of the cross sections is lower at high energies. Collision strengths for electron scattering by 0 + , N + , and 0 ++ are presented.

Effect of solar activity on the morphology of 7320 Å dayglow emission

“…The values of these coefficients are summarized in Table 1. Henry et al (1969) The quenching factor is given by…”

H2generation in Ar/NH3microdischarges

“…For example, although the thermal dissociation of NH 3 by argon, [28] e + N → N + e b [29] e + N → e + N* b,g [30] e + N → N + + e + e b [31] e + N 2 → N 2 + e b [32] e + N 2 → N 2 (v)+ e b,g [32] e + N 2 → N 2 *+ e b,g [32] e + N 2 → N + N + e b [33] has a small rate coefficient, the total rate of the reaction can be large as the pressure increases. As the temperature increases, other endothermic reactions also begin to become important.…”

Chemical Reaction Mechanisms for Modeling the Fluorocarbon Plasma Etch of Silicon Oxide and Related Materials

“…Other data for CF x (x=0-3) species were computed by McKoy [25], obtained from Morgan [26], Tarnovsky [27], or, for cases where no data were available, by copying the analogous CF 4 reaction and adjusting the electron energy loss appropriately [2]. Rate data for C atoms are based on cross sections from Henry, et al [28]. Those for F atom excitations are based on calculations of Baliyan and Bahtia [29], and ionization data from Hayes, et al [30] For some reactor conditions, especially those with high oxide etch rates, the etch products constitute a substantial fraction of the plasma species, so electron impact reactions of SiF x (x=1-4), CO and O 2 are included in the mechanism.…”