Scanning strategy-dependent etching rate in the formation of through-via holes by femtosecond laser-assisted etching
Shogo Matsuda,
Shigeki Matsuo
Abstract:In this study, we used femtosecond laser-assisted etching (FLAE) to drill through glass vias (TGVs) in 0.3 mm thick non-alkali glass substrates. 
In FLAE, the focus of the femtosecond laser pulses is scanned to modify the material along a preprogrammed pattern, and the modified region is preferentially removed by chemical etching. 
We found that the scanning strategy affected the etching rate along the laser-modified lines. 
Among four types of scanning strategies tested, the strategy… Show more
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