Scanner and etch co-optimized corrections for better overlay and CD control

Jeong, Ikhyun; Koo, Seung-Woo; Kim, Hyun-Sok; Ju, Jae-Wuk; Kim, Young‐Sik; Cho, Yong-Tae; Kim, Heung-Joo; Viatkina, Katja; Hemert, T. van; Wit, Ruud de; Deckers, David; Chen, Owen; Oh, Nang-Lyeom; Musselman, Marcus; Carbery, Marcus; Chen, Ssuwei; Schmidt, Lucian; Kwon, Heidi; Lee, Jae Gyoo

doi:10.1117/12.2516578

Advanced Etch Technology for Nanopatterning VIII 2019

DOI: 10.1117/12.2516578

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Scanner and etch co-optimized corrections for better overlay and CD control

Ikhyun Jeong

Seung-Woo Koo

Hyun-Sok Kim

et al.

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Scanner and etch co-optimized corrections for better overlay and CD control

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