Scaling up the sub-50 nm-resolution roll-to-roll nanoimprint lithography process via large-area tiling of flexible molds and uniform linear UV curing

Moon, Chang-Kwon; Han, Kyoung-Sik; Kim, Minwook; Oh, Dong Kyo; Yi, Sol; Kim, Tae Hyun; Kim, Hong‐Kyu; Hwang, Jaehyun; Nam, Jung Gun; Lee, Dongeon; Lee, Dae-Young; Jo, Gug Rae; Ok, Jong G.

doi:10.1007/s12206-022-1227-y

Cited by 3 publications

(1 citation statement)

References 33 publications

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“…However, UV light diffraction led to premature resin curing in subsequent areas. Other research has applied overlapping imprinting to achieve seamless large-area nanopatterns [ 33 , 34 , 35 , 36 ], but such attempts resulted in defects at overlapping regions, affecting device performance. Kataza Shingo et al proposed a double lithography method enabling large-scale continuous nanostructure fabrication while sacrificing efficiency [ 37 ].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Zhan,

Deng,

Dai

et al. 2024

Nanomaterials

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Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro–nano optics, flexible electronics, optical communication, and biomedicine studies.

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Section: Introductionmentioning

confidence: 99%

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Zhan,

Deng,

Dai

et al. 2024

Nanomaterials

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Features of the modern development of metal‐insulator‐metal waveguide based plasmonic sensors

Butt

2024

Applied Research

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Plasmonic sensors based on metal‐insulator‐metal (MIM) waveguides are renowned for their miniaturization and high sensitivity in various sensing applications. A broad spectrum of researchers is numerically investigating the characteristics of MIM waveguide‐based plasmonic sensors with diverse cavity shapes. However, practical demonstrations of these sensors have not yet been realized, primarily due to the overlooked aspect of the light coupling mechanism into these waveguides. In this context, two distinct methods for coupling light into and out of plasmonic chips based on MIM waveguides are presented.

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Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures

Kim,

Kyeong,

Kwak

2024

Small Structures

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Demands for micro‐ and nano‐fabrication techniques have been increasing over recent decades due to their foundational importance in fields such as electronics, sensors, displays, biotechnologies, and energy technologies. Still, the rapid and efficient fabrication of complex 3D microstructures has long been a challenge due to the inherent limitations of conventional imprint lithography and the slow fabrication speed of maskless lithography systems using femtosecond lasers. This study introduces a novel lithographic replication method for the rapid replication of intricate 3D microstructures with closed‐loops by leveraging the Poisson effect‐driven lateral deformation of soft molds. Specifically, the suggested technique employs an elastomeric soft mold, engraved with negative cavity parts of the target structure separated by intentional gaps. Lateral deformation of the material allows the separated cavities to assemble for replication of target microstructure and defectless release from the soft mold. In addition to the experimental demonstrations of the proposed method using well‐known materials like polydimethysliloxane (PDMS) for the soft mold and UV‐curable polyurethane acrylate (PUA) for replication, essential considerations such as material selection and master mold design are discussed. The presented method not only broadens the capabilities of imprint lithographic techniques but also holds promise for the large scale, continuous fabrication of complex 3D microstructures.

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Scaling up the sub-50 nm-resolution roll-to-roll nanoimprint lithography process via large-area tiling of flexible molds and uniform linear UV curing

Cited by 3 publications

References 33 publications

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Features of the modern development of metal‐insulator‐metal waveguide based plasmonic sensors

Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures

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