2011
DOI: 10.1103/physreve.83.041605
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Scaling in film growth by pulsed laser deposition and modulated beam deposition

Abstract: The scalings in film growth by pulsed laser deposition (PLD) and modulated beam deposition (MBD) were investigated by Monte Carlo simulations. In PLD, an atomic pulse beam with a period t(0) were deposited instantaneously on a substrate, whereas in MBD, adatoms were deposited during a short time interval t(1) (0≤t(1)≤t(0)) within each period. If t(1)=0, MBD will be identical to PLD and, if t(1)=t(0), MBD will become usual molecular beam epitaxy (MBE). Specifically, logarithmic scaling was investigated for the … Show more

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“…[46,87,88] kMC type models have been used extensively in order to study growth of metal/semiconductor systems, as well as several oxide systems. [89][90][91][92][93][94][95][96][97][98] Moreover, kMC models are previously used to explain atomistic growth during oxide homoepitaxy, e.g., layerby-layer and step-flow growth. [99,100] .…”
Section: Introductionmentioning
confidence: 99%
“…[46,87,88] kMC type models have been used extensively in order to study growth of metal/semiconductor systems, as well as several oxide systems. [89][90][91][92][93][94][95][96][97][98] Moreover, kMC models are previously used to explain atomistic growth during oxide homoepitaxy, e.g., layerby-layer and step-flow growth. [99,100] .…”
Section: Introductionmentioning
confidence: 99%