1992
DOI: 10.1103/physrevb.46.12675
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Scaling analysis of diffusion-mediated island growth in surface adsorption processes

Abstract: We examine the competition between diffusion-mediated irreversible nucleation and growth of islands during submonolayer deposition on perfect substrates. We provide a detailed scaling theory for the complete distribution of island sizes and separations, both with the ratio of diffusion to deposition rate and with time. Scaling functions and exponents are obtained by simulation. The leading scaling behavior is independent of details of the island structure. These results are supplemented by an analysis of rate … Show more

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Cited by 482 publications
(336 citation statements)
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“…In order to appropriately analyze such experimental data for the metal island or row size distribution, we first recall a central observation from recent analyses in nucleation theory. For island formation during deposition, simulation 11,12 and theory 12,13 indicate that the density ͑per site͒ of islands of size s ͑measured in atoms͒ satisfies the scaling relation…”
Section: Experimental Results and Analysismentioning
confidence: 99%
“…In order to appropriately analyze such experimental data for the metal island or row size distribution, we first recall a central observation from recent analyses in nucleation theory. For island formation during deposition, simulation 11,12 and theory 12,13 indicate that the density ͑per site͒ of islands of size s ͑measured in atoms͒ satisfies the scaling relation…”
Section: Experimental Results and Analysismentioning
confidence: 99%
“…Both processes are expected to be associated with the formation of 'craters' or even the openings penetrating through the oxide toward the substrate surface [29,33,34]. Therefore, the rate constants K 3 and K 35 should be orders of magnitude lower than that given by the effective Ga diffusivities (σ 3 D 3 and σ 35 D 3 , with σ as the corresponding capture coefficients [35][36][37]). …”
Section: The Modelmentioning
confidence: 99%
“…Within the frame of the irreversible growth model, that is, with neglect of decay of both Ga-Ga and Ga-As surface dimers [35][36][37], the set of kinetic equations for the surface density of Ga droplets (N 3 ), parasitic GaAs islands (N 35 ) and Ga adatoms (n 3 ) can be written as Here, we assume that the kinetic growth constants are the same for differently sized surface clusters, as in [36] and [37]. The first equation shows that the number of Ga droplets increases due to the Ga-Ga dimerization, with K 3 n 3 2 as the nucleation rate in irreversible growth [37].…”
Section: The Modelmentioning
confidence: 99%
“…These are called limitedmobility models because the diffusion of a deposited atom, whenever possible, takes place in a restricted time interval before the deposition of another atom. More complex models involve the competition among deposition, diffusion and aggregation [14,15,16], being able to represent real systems' features quantitatively.…”
Section: A Interface Growthmentioning
confidence: 99%