2004
DOI: 10.1021/nl049659j
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Scalable Interconnection and Integration of Nanowire Devices without Registration

Abstract: A general strategy for the parallel and scalable integration of nanowire devices over large areas without the need to register individual nanowire−electrode interconnects has been developed. The approach was implemented using a Langmuir−Blodgett method to organize nanowires with controlled alignment and spacing over large areas and photolithography to define interconnects. Centimeter-scale arrays containing thousands of single silicon nanowire field-effect transistors were fabricated in this way and were shown… Show more

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Cited by 344 publications
(298 citation statements)
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References 27 publications
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“…4b; see also Supplementary Information, Fig. S4) yield a peak transconductance, g m ¼ dI d /dV g , of 6 mS with an on current, I on , of $16 mA, an on/off ratio .10 5 and a threshold voltage, V t , of 0.55 V. These values compare well with, or exceed, previous multi-Si NW FETs prepared using Langmuir-Blodgett assembly 8 , and moreover, significant improvements should be possible, for example, by substituting much higher performance Ge/Si core/shell NWs 22 . Importantly, histograms of V t and I on ( Fig.…”
Section: Large-area Transistor Arrayssupporting
confidence: 82%
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“…4b; see also Supplementary Information, Fig. S4) yield a peak transconductance, g m ¼ dI d /dV g , of 6 mS with an on current, I on , of $16 mA, an on/off ratio .10 5 and a threshold voltage, V t , of 0.55 V. These values compare well with, or exceed, previous multi-Si NW FETs prepared using Langmuir-Blodgett assembly 8 , and moreover, significant improvements should be possible, for example, by substituting much higher performance Ge/Si core/shell NWs 22 . Importantly, histograms of V t and I on ( Fig.…”
Section: Large-area Transistor Arrayssupporting
confidence: 82%
“…1d), which resolve individual Si NWs within the transferred BBF, show that the Si NWs recorded from different areas of this large substrate are well aligned along the upward expansion direction of the bubble. Indeed, the angular deviation of the Si NWs is less than 108 over the entire 150-mmdiameter wafer and represents a very substantial advance over previous studies [4][5][6][7][8] .…”
Section: Blown Bubble Filmsmentioning
confidence: 87%
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“…The combination of tunable conducting properties of semiconducting NWs (16)(17)(18)(19)(20) and the ability to bind analytes on their surface yields direct, label-free electrical readout, which is exceptionally attractive for many applications (23 -31). We discuss representative examples in which these new sensors have been used for detecting a wide range of biological and chemical species.…”
Section: Dmentioning
confidence: 99%