2007
DOI: 10.1109/bipol.2007.4351876
|View full text |Cite
|
Sign up to set email alerts
|

Safe Operating Area from Self-Heating, Impact Ionization, and Hot Carrier Reliability for a SiGe HBT on SOI

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
4
0

Year Published

2009
2009
2021
2021

Publication Types

Select...
4
3

Relationship

1
6

Authors

Journals

citations
Cited by 8 publications
(4 citation statements)
references
References 2 publications
0
4
0
Order By: Relevance
“…4, the IV mismatch increases with V BE . Some previous work has demonstrated that the SiGe HBT stability in the bias range of 0.1mA/µm 2 is defined by a combined effect of thermal instability and impact ionization [4]. Base current reversal at constant V BE drive was tested to gauge the impact ionization of all DUTs.…”
Section: Device Technology and Experimentsmentioning
confidence: 99%
“…4, the IV mismatch increases with V BE . Some previous work has demonstrated that the SiGe HBT stability in the bias range of 0.1mA/µm 2 is defined by a combined effect of thermal instability and impact ionization [4]. Base current reversal at constant V BE drive was tested to gauge the impact ionization of all DUTs.…”
Section: Device Technology and Experimentsmentioning
confidence: 99%
“…To operate the device in safe mode the self heating and breakdown analysis has to be performed which is called electro-thermal instability and it also important for large signal analysis. To control thermal instability due to high current operation in the device, self-heating characteristics need to be observed [6]. Initially the modelling parameters of Silvaco T-CAD tool are properly tuned to validate with experimental results of [7].…”
Section: Introductionmentioning
confidence: 99%
“…Literature has elaborated extensively on the fundamental restrictions/ limitations of standard SOI substrates for high power applications [1][2][3][4][5]. Indeed, in standard SOI, a SiO 2 layer separates the top mono-crystalline Si layer (that hosts the active device where the electrical power is dissipated into heat) from the bottom Si body that provides mechanical support during wafer handling and a medium to conduct heat towards the heat sink.…”
Section: Introductionmentioning
confidence: 99%