Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition

Seghete, Dragos; Davidson, B.; Hall, Robert A.; Chang, Yuan‐Jen; Bright, Victor M.; George, Steven M.

doi:10.1016/j.sna.2008.12.016

Cited by 26 publications

(19 citation statements)

References 39 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The difference in chemistry of the materials constructing the multilayer system makes it possible for selective etching of one or the other layers using various etchants. It has been seen earlier where one or more layers of the multilayer film have been etched for use in NEMS applications . A similar attempt has been made here to obtain ZnO nanosheets by selective etching of the organic zincone layer.…”

Section: Resultsmentioning

confidence: 72%

The ALD‐MLD Growth of a ZnO‐Zincone Heterostructure

Choudhury

Sarkar

2014

Chemical Vapor Deposition

View full text Add to dashboard Cite

A mixed inorganic/organic zinc oxide/zincone multilayer film, using a combination of atomic layer deposition (ALD) and molecular layer deposition (MLD), is grown. A molecular fragment is deposited in each half reaction in the MLD technique, thus making it similar to, and compatible with, the ALD method of deposition. Zinc oxide inorganic layers are grown at a substrate temperature of 150°C with alternate surface-saturating reactions of diethylzinc and water. Under similar growth condition, diethylzinc and hydroquinone are used to deposit an organic zincone layer that follows the MLD reaction mechanism. Deposition rates are obtained from an in-situ quartz crystal microbalance (QCM) and verified using X-ray reflectivity (XRR) measurements and scanning electron microscopy (SEM). Chemical constituents of the hybrid layers are confirmed from secondary ion mass spectroscopy (SIMS) and Fourier transform infrared (FTIR) spectroscopy. Selective etching of the organic layers results in the formation of zinc oxide nanosheets stacked together by van der Waals attraction balanced by Coulombic repulsion.

show abstract

Section: Resultsmentioning

confidence: 72%

The ALD‐MLD Growth of a ZnO‐Zincone Heterostructure

Choudhury

Sarkar

2014

Chemical Vapor Deposition

View full text Add to dashboard Cite

show abstract

“…It was observed that HCl could be used to etch the thin film in a controlled manner, which makes of TMA+tris(2-hydroxyethyl)amine+furan-2,5-dione hybrid films promising materials for MEMS/NEMS applications [16]. …”

Section: Reviewmentioning

confidence: 99%

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Sundberg¹,

Karppinen²

2014

Beilstein J. Nanotechnol.

281

346

View full text Add to dashboard Cite

SummaryThe possibility to deposit purely organic and hybrid inorganic–organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic–organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications.

show abstract

“…The ability of a polymer to degrade when needed also has application in microengineering as polymer films can be used as a sacrificial layer during fabrication of micro electromechanical systems (MEMS). 68 Degradation is not always desirable. It is well known that degradation of polymers can lead to reduced performance and the limited lifespan of devices in which these films are employed.…”

Section: The State Of Research Into the Degradation Of Thin Polymer Fmentioning

confidence: 99%

Degradation of polymer films

Cheneler

Bowen

2013

Soft Matter

View full text Add to dashboard Cite

In this review paper the current state of research into the physical degradation of polymer films is elucidated. Modern applications of polymer films and the implication of their degradation are discussed. Recent investigations into solid interactions such as abrasion, adhesion, fatigue and other failure modes as well as plasma and photonic interactions are examined. This investigation highlights key degradation mechanisms as well as areas where controversy over these mechanisms lies, and suggests directions for future research.

show abstract

Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition

Cited by 26 publications

References 39 publications

The ALD‐MLD Growth of a ZnO‐Zincone Heterostructure

The ALD‐MLD Growth of a ZnO‐Zincone Heterostructure

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Degradation of polymer films

Contact Info

Product

Resources

About