Round-robin measurements of 100- and 60-nm scales among a deep-ultraviolet laser diffractometer, a scanning electron microscope and various atomic force microscopes

Misumi, Ichiko; Gonda, Satoshi; Satô, Osamu; Yasutake, Masatoshi; Kokawa, Ryohei; Fujii, Tôru; Kojima, Nobuo; Kitamura, Shinichi; Tamochi, Ryuichiro; Kitta, J.; Kurosawa, Tomizo

doi:10.1088/0957-0233/18/3/032

Cited by 12 publications

(8 citation statements)

References 17 publications

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“…The NMIJ developed prototype nanometric lateral scales, special 1D-grating standards (50-100 nm pitches) using electron beam lithography and calibrated the scales using the AFM with differential laser interferometers (DLI-AFM) [8,9]. NMIJ is checking the quality of the developed scales through intercomparison using a deep-ultraviolet (DUV) laser diffractometer, a critical dimension scanning electron microscope (CD-SEM), and a metrological and a conventional AFM [10].…”

Section: Introductionmentioning

confidence: 99%

Application of a GaAs/InGaP superlattice in nanometric lateral scales

Misumi

Gonda

Satô

et al. 2007

Meas. Sci. Technol.

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The National Institute of Advanced Industrial Science and Technology (AIST), National Metrology Institute of Japan (NMIJ) developed nanometric lateral scales (design pitch: 25 nm) consisting of a GaAs/InGaP superlattice (multilayer) for atomic force microscope (AFM) and scanning electron microscope (SEM) calibration. The pitch of the fabricated nanometric lateral scales was measured using our AFM with a differential laser interferometer (DLI-AFM) and the uncertainty in the pitch measurements was evaluated. The average pitch and its expanded uncertainty (k = 2) were 25.39 nm and 0.43 nm, respectively. The quality of the developed scales was high enough to make them a suitable candidate for CRMs. On the basis of the obtained results in this technical study, the fabrication procedure and layout of the nanometric lateral scales will be optimized for the future distribution of these scales.

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Section: Introductionmentioning

confidence: 99%

Application of a GaAs/InGaP superlattice in nanometric lateral scales

Misumi

Gonda

Satô

et al. 2007

Meas. Sci. Technol.

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“…AFM is a powerful technique for measuring nanometer-scale line pitch and nanostructure topography. [19][20][21][22][23] Figure 5 shows the principle of pitch measurement and a schematic diagram of MAFM. The system uses a custom-built LabView program in an industrial computer to servo control the two-dimensional scan of the flexure stage, to read the voltage of the Z-axis capacitance sensor of the AFM apparatus, and to read the displacements of the flexure stage relative to the reference mirrors from the differential plane mirror laser interferometers (SIOS AE SP 500 DD E).…”

Section: Mafm Methodsmentioning

confidence: 99%

Grating Pitch Measurement Beyond the Diffraction Limit with Modified Laser Diffractometry

Pan

Liu

Tasi

et al. 2011

Jpn. J. Appl. Phys.

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The demand for accurate measurements of nanostructures is increasing for the microprocesses and nanotechnology used in the semiconductor industry. In this study, we present an improved method for measuring gratings with a pitch size lower than one-half of the laser wavelength by using a modified laser diffractometer (LD). In experiments, the modified LD with a 633 nm laser is used to measure a grating with a 288 nm pitch size. This result is compared with results measured by both a metrological atomic force microscope and the traditional LD with a 543 nm laser. The validity of this method is demonstrated. The difference between the pitch size of 288 nm obtained by these three methods is approximately 0.17 nm.

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“…A conventional OD provides superior measurement accuracy. 18,19) Most OD methods are based on the Littrow configuration 20) where the diffraction beam coincides with the incident laser beam, although various designs have been presented for measuring the grating pitch. The pitch size is calculated from the laser wavelength and diffraction angle, and the minimum measurable grating pitch is about one-half of the laser wavelength.…”

Section: Od Methodsmentioning

confidence: 99%

Method for Determining the Angle in Two Dimension Nanoscale: Pitch Grating

Pan¹,

Liu²,

Tasi³

et al. 2011

Jpn. J. Appl. Phys.

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A two-dimensional (2D) grating is useful for calibrating the accuracy of an electron microscope and atomic force microscope (AFM). An inter laboratory comparison has been carried out for measuring pitches and angles of 2D gratings with 292 and 1000 nm pitches using both AFM and an optical diffractometer (OD). The grating angle at the 292 nm pitch size was obtained at some of the laboratories by the conventional OD method. However, they could not measure the grating angle when the grating pitch was smaller than (λ/2) ×√2, where λ denotes the laser wavelength. We propose a diffraction angle rotation method of grating angle measurements. Using a precision rotary table along with diffractive light, we accurately measure a 2D grating angle for any pitch size larger than λ/2.

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Round-robin measurements of 100- and 60-nm scales among a deep-ultraviolet laser diffractometer, a scanning electron microscope and various atomic force microscopes

Cited by 12 publications

References 17 publications

Application of a GaAs/InGaP superlattice in nanometric lateral scales

Application of a GaAs/InGaP superlattice in nanometric lateral scales

Grating Pitch Measurement Beyond the Diffraction Limit with Modified Laser Diffractometry

Method for Determining the Angle in Two Dimension Nanoscale: Pitch Grating

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