2022
DOI: 10.1149/1945-7111/ac48c5
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Room-Temperature Preparation of Ta Ions-Containing Ionic Liquid and its Vapor Deposition toward Ta-Oxide Film Coating

Abstract: Ta ions-containing solutions, which are brown in color with no precipitation, were successfully prepared through an electroelution process with ionic liquid (IL). An as-delivered Ta metal plate covered with a passivation oxide film could be easily eluted even at room temperature by simply applying an anodic potential of, e.g. +2.2 V vs. Ag in [Bmim][PF6] IL. According to the quantity of electric charge required for oxidation of Ta, most Ta ions in the IL were suggested to be in an oxidation state of +5, which … Show more

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Cited by 2 publications
(2 citation statements)
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“…For example, the thermal evaporation of Ta metal, whose melting temperature is approximately 3000 °C [ 64 ], is so difficult that the thin films of Ta metal and its compounds, such as Ta oxides, have been fabricated by chemical vapor deposition (CVD) [ 65 ]. In this section, the vacuum deposition of Ta ions-containing IL and its following conversion into a Ta-oxide film is introduced as a model application of metal-ions containing ILs [ 66 ].…”
Section: Applications Of Vacuum-deposited Ilsmentioning
confidence: 99%
See 1 more Smart Citation
“…For example, the thermal evaporation of Ta metal, whose melting temperature is approximately 3000 °C [ 64 ], is so difficult that the thin films of Ta metal and its compounds, such as Ta oxides, have been fabricated by chemical vapor deposition (CVD) [ 65 ]. In this section, the vacuum deposition of Ta ions-containing IL and its following conversion into a Ta-oxide film is introduced as a model application of metal-ions containing ILs [ 66 ].…”
Section: Applications Of Vacuum-deposited Ilsmentioning
confidence: 99%
“…In the electrodeposition of Ta metal in IL, as demonstrated by the F. Endres group, Ta ions-containing IL solutions are conventionally prepared by dissolving Ta salts, such as TaF 5 , in IL [ 64 , 67 ]. On the other hand, we have recently succeeded in the preparation of Ta ions-containing IL solutions through a direct electroelution process with an IL of [bmim][PF 6 ] in a glove box [ 66 ]. In this process, the concentration of Ta ions is well adjusted by controlling the application time of electroelution, with a good linear relationship between them.…”
Section: Applications Of Vacuum-deposited Ilsmentioning
confidence: 99%