Room Temperature NH3 – Sensing Properties of WO3 thin films Synthesized by Microprocessor Controlled Spray Pyrolysis

Grace, P. Shanthini; Devadasan, J. Jebaraj; Jeyadheepan, K.; Thangam, G. Jeevarani

doi:10.9790/4861-17002035256

Cited by 3 publications

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References 7 publications

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“…WO 3 is an n -type semiconductor successfully used for many applications, such as in electrochromic [ 1 , 2 , 3 ] and sensing devices [ 4 , 5 , 6 ], thanks to its excellent chromic properties, inherent electrical conductivity and excellent sensitivity and selectivity toward CO [ 4 ], NO 2 [ 5 ], NH 3 [ 7 ], H 2 S [ 8 ] gases. Recently, nanostructured WO 3 gained large scientific interest because of improved performances, with respect to bulk material [ 9 , 10 , 11 , 12 , 13 , 14 ].…”

Section: Introductionmentioning

confidence: 99%

Investigation of WO3 Electrodeposition Leading to Nanostructured Thin Films

et al. 2020

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Nanostructured WO3 represents a promising material for electrochromic and sensing devices. In this scenario, electrodeposition is a promising low-cost approach for careful production. The electrodeposition of tungsten oxide film from a peroxo-tungstic-acid (PTA) solution is investigated. WO3 is synthetized onto Indium doped Tin Oxide (ITO) substrates, in a variety of shapes, from a fragmentary, thin layer up to a thick continuous film. Samples were investigated by scanning electron (SEM) and atomic force microscopy (AFM), Rutherford backscattering spectrometry (RBS), X-ray Diffraction analysis (XRD), energy gap measurement. Electrodeposition current curves are compared with characterization results to model the growth process. Early stages of electrodeposition are characterized by a transient cathodic current revealing an instantaneous nucleation followed by a diffusion limited process. A quantitative analysis of W deposition rate and current at working electrode validates a microscopic model for WO3 electrodeposition driving the process towards nanostructured versus continuous WO3 film.

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