Room temperature deposition of magnetite thin films on organic substrate

Pulsed plasma deposition of zirconia thin films on UHMWPE: proof of concept of a novel approach for joint prosthetic implants

“…35 Recently, Pulsed Plasma Deposition (PPD) has been emerging as a powerful physical vapor deposition technique able to stoichiometrically deposit thin lms of a number of materials such as complex oxides, nitrides, carbides, carbonbased lms, semiconductors, etc. [36][37][38] A primary advantage of PPD is the ability to efficiently work even at room temperature, 39,40 enabling the deposition on heat-sensitive substrates like plastics. PPD is conceptually similar to the more widespread PLD but when compared to the latter it presents several advantages, as a direct consequence of the different nature of the ablating source (electrons vs. photons): higher pulse energy, frequency and energy efficiency (>30%); capability to ablate wide band-gap or highly reective materials (E g > 6 eV); easier scalability of the process for the deposition of large area lms by relatively low-cost multiple systems.…”

The Pulsed Electron Deposition Technique for Biomedical Applications: A Review

“…In the frame of physical vapor deposition (PVD) techniques, pulsed electron deposition (PED) is a well-established technology to fabricate thin films for photovoltaic, superconductor, and optoelectronic applications [1][2][3][4][5][6][7]. PED technology belongs to the family of the channel spark discharges, a type of hollow cathode glow discharge in which a target material is ablated by the local heating induced by an accelerated electron beam [8,9].…”

“…Indeed, with respect to PLD, PPD also enables one to process transparent or highly reflective materials and it exhibits higher electrical efficiency (30%) and lower capital costs [16]. A further advantage of PPD is the possibility to produce films with a controlled stoichiometry of the target, even for complex compounds, such as La 0.7 Sr 0.3 MnO 3 [2]. In the framework of photovoltaic and optoelectronic applications, PPD has been employed for the deposition of a wide range of inorganic thin films, such as tungsten-doped thin oxide [1,4], pyrite [17], and transparent conductive p-type lithium doped [6] and potassium-doped [7] nickel oxide.…”

Tough and adhesive nanostructured calcium phosphate thin films deposited by the pulsed plasma deposition method

“…15 Recently, the Pulsed Plasma Deposition (PPD) technique has been emerging as a valid technique for the stoichiometric deposition of well adherent and nanostructured thin lms of a number of materials. 16,17 The working principle of PPD is based on the ablation of a target material by a highly-energetic pulsed electron beam; consequently, the ablated material is deposited on a substrate hold at suitable distance. The pulsed ablation process allows obtaining a high control on the nal lm thickness and roughness.…”