1995
DOI: 10.1109/68.473453
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Room-temperature continuous-wave operation of 1.54-μm vertical-cavity lasers

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Cited by 162 publications
(29 citation statements)
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“…INCE the first CW room-temperature operating devices were fabricated [1], long-wavelength vertical-cavity lasers (VCL's) have gained considerable interest. As a potential next-generation light source for future optical communication systems, they offer a variety of advantages such as costeffective fabrication, on-chip-testability, array fabrication, and effective fiber coupling.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…INCE the first CW room-temperature operating devices were fabricated [1], long-wavelength vertical-cavity lasers (VCL's) have gained considerable interest. As a potential next-generation light source for future optical communication systems, they offer a variety of advantages such as costeffective fabrication, on-chip-testability, array fabrication, and effective fiber coupling.…”
mentioning
confidence: 99%
“…We analyze the pulsed output characteristics of 1.54-m VCL's, based on an InP-GaInAsP integrated bottom mirror. This design offers full-wafer-scale fabrication, in contrast to the successfully operating wafer fused devices [1], [8]. Lasers with a varying offset between cavity mode and PL are fabricated and the threshold current for different temperatures is recorded.…”
mentioning
confidence: 99%
“…Each section of a device can be optimized using the material best suited for its function. Examples are long wavelength vertical cavity surface emitting lasers with InGaAsP active region and GaAs/AlAs mirrors [5,6], or high gain-bandwidth product avalanche photodetectors with InGaAs absorption layer and Si multiplication region [7]. In this paper we will describe use of wafer fusion to fabricate threedimensional photonic integrated circuits.…”
Section: Wafer Fusionmentioning
confidence: 99%
“…actual ridge waveguide, there is a large leakage current that can be reduced by etching mesas and depositing metal only on the FVC ridge regions. When wafer fusion technique is used to fabricate VCSELs and detectors [3,[5][6][7], those devices are relatively small and uniformity of the fused material is not so critical for individual device operation. To make long waveguide couplers and switches, on the other hand, requires a good uniformity of the fusion interface.…”
Section: Fused Vertical Switchmentioning
confidence: 99%
“…The threshold current of this structure was 11mA. Wafer fusion has been developed by University of California Santa Barbara in 1995 (Babic et al, 1995). Chemical bonds are directly achieved between two materials without an intermediate layer at the heterointerface.…”
mentioning
confidence: 99%