2007
DOI: 10.1103/physrevb.75.085423
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Room-temperature atmospheric oxidation of Si nanocrystals after HF etching

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Cited by 117 publications
(137 citation statements)
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“…51 However, some other researchers hold a different viewpoint that such a change of steady-state PL in Si QDs is caused by a blue emission surface center induced during the oxidation process. 52 In our sample, a new red-shifted PL occurred during oxidation. A possible explanation for this phenomenon is that new surface states constitute during oxidation.…”
Section: Resultsmentioning
confidence: 99%
“…51 However, some other researchers hold a different viewpoint that such a change of steady-state PL in Si QDs is caused by a blue emission surface center induced during the oxidation process. 52 In our sample, a new red-shifted PL occurred during oxidation. A possible explanation for this phenomenon is that new surface states constitute during oxidation.…”
Section: Resultsmentioning
confidence: 99%
“…The light emission from Si and Ge NCs is usually inherently dependent on the NC-size-induced quantum confinement effect. [12][13][14][15] However, other structural factors such as surface chemistry, [16][17][18][19][20] alloying, 21,22 doping 23,24 and defects [25][26][27] have also been found to affect the light emission from Si and Ge NCs. Regarding defects, dangling bonds at the NC surface have been the most extensively investigated.…”
Section: Introductionmentioning
confidence: 99%
“…Regarding defects, dangling bonds at the NC surface have been the most extensively investigated. Both experiments 26,28 and calculations 29,30 showed that the light emission from Si and Ge NCs might be significantly affected by dangling bonds at the NC surface. As a type of planar defects, twins have been frequently observed in transmission electron microscopy (TEM) analysis.…”
Section: Introductionmentioning
confidence: 99%
“…The majority of the oxygen gets incorporated in a Si-Si bond as shown by the Si-O-Si stretching modes (1050, 1107, and 1160 cm À1 ). [36][37][38] This is also shown in the Si-H stretching modes with at least one oxygen atom back-bonded to the Si atom (OSi 2 -Si-H @ 2140 cm À1 , O 2 Si-Si-H @ 2190 cm À1 , and O 3 -Si-H @ 2250 cm À1 ). This demonstrates that most of the oxygen is incorporated in the back bonds of the Si atoms at the surface of Si NCs.…”
mentioning
confidence: 99%
“…4(a). Besides the typical stretching modes for hydrogenated Si surfaces (Si 4Ày -Si-H y @$ 2106 cm À1 ), 36 various stretching modes can be observed that represent bonding configurations that include oxygen as well. The majority of the oxygen gets incorporated in a Si-Si bond as shown by the Si-O-Si stretching modes (1050, 1107, and 1160 cm À1 ).…”
mentioning
confidence: 99%