Roll-to-roll deposition of silicon oxynitride layers on polymer films using a rotatable dual magnetron system

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

“…Except the tunable refractive index, SiN x O y also has adjustable thin film stress [25] and exhibits photoluminescence (PL) in the visible light range at room temperature [26]. Thus, SiN x O y is highly attractive in integrated circuits (IC) [27], barrier layers [28,29], non-volatile memory [30], optical waveguides [31], organic light emitting diode (OLED) [32], and anti-scratch coatings [33,34]. This review presents a discussion and summary of the preparation methods, performance, and applications of SiN x O y film.…”

Periodic density fluctuations in sputtered aluminum‐doped silicon oxynitride layers

“…Our study adds further insight into the morphological evolution in thin films produced by complex, multiple‐pass deposition. In‐line sputtering of oxynitride was previously reported for processes involving only one or two‐passes for the fabrication of single layered films . It is known that transition layers can appear at the boundaries between adjacent films in multilayered systems.…”

“…Vertical composition variations of ca . 100 nm length scale was experimentally observed in 300 nm‐thick SiO x N y layers sputtered by two rotatable magnetrons, using glow discharge optical emission spectroscopy and secondary ion mass spectroscopy . At high plasma densities, nitrogen is preferentially incorporated, whereas oxygen is preferentially incorporated at low plasma densities.…”

“…In-line sputtering of oxynitride was previously reported for processes involving only one or two-passes for the fabrication of single layered films. [15][16][17][18] It is known that transition layers can appear at the boundaries between adjacent films in multilayered systems. Due to the relatively small thickness of such transition layers, it is challenging to distinguish individual layers by standard optical characterization in the studied multilayered systems.…”

“…100 nm length scale was experimentally observed in 300 nm-thick SiO x N y layers sputtered by two rotatable magnetrons, using glow discharge optical emission spectroscopy and secondary ion mass spectroscopy. 18 At high plasma densities, nitrogen is preferentially incorporated, whereas oxygen is preferentially incorporated at low plasma densities. To our best knowledge, there are probably no other published reports on detailed analysis of the compositional profile modulation on nanometer scale in oxynitride thin films fabricated by multi-pass processing or similar technique inclusive of growth interruptions.…”