“…Ultrashort laser pulses are now used to manipulate the structure and function of materials at far from equilibrium states (1)(2)(3)(4)(5)(6)(7)(8)(9), with the corresponding ultrafast dynamics being one of the ultimate problems in modern science and technology. In terms of applications, the femtosecond and nanosecond pulsed laser was first used to deal with the annealing of the amorphous layer of ion-implanted silicon (Si) in the late 1970s (10) and then extended to annealing the lattices of other semiconductors, such as Si (11)(12)(13)(14)(15)(16)(17)(18)(19)(20)(21)(22)(23), GaAs (2,15,24,25), InSb (1,3,(26)(27)(28)(29), and Ge (30,31). Soon after the discovery of the so-called pulsed laser annealing, it was established that this laser annealing is an ultrafast nonthermal melting process (32)(33)(34)(35) in which the photoexcited electrons are hot and the ions are still cold (in terms of kinetic energy) because the lattice disordering starts and finishes well before the completion of carrier-lattice thermalization via electron-phonon coupling.…”