a b s t r a c t 8 a r t i c l e i n f o 9 10 Available online xxxx 11 12The dissociative chemisorption of HCl on clean and oxidized Cu(100) surfaces has been investigated using x-ray 13 photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). Whereas the dissociation of HCl at 14 the clean surface is limited to the formation of a (√2 × √2)-R45°Cl(a) monolayer, the presence of surface oxygen 15 removes this barrier, leading to chlorine coverages up to twice that obtained at the clean surface. Additional fea-16 tures in the STM images that appear at these coverages are tentatively assigned to the nucleation of CuCl islands.17 The rate of reaction of the HCl was slightly higher on the oxidized surface but unaffected by the initial oxygen 18 concentration or the availability of clean copper sites. Of the two distinct domains of adsorbed oxygen identified 19 at room temperature on the Cu(100) surfaces, the (√2 × √2)-R45°structure reacts slightly faster with HCl than 20 the missing row (√2 × 2√2)-R45°O(a) structure. The results address the first stages in the formation of a copper 21 chloride and present an interesting comparison with the HCl/O(a) reaction at Cu(110) surfaces, where oxygen 22 also increased the extent of HCl reactions. The results emphasize the importance of the exothermic reaction to 23 form water in the HCl/O(a) reaction on copper.24