2011
DOI: 10.1103/physrevb.84.214517
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Role of grain size in superconducting boron-doped nanocrystalline diamond thin films grown by CVD

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Cited by 43 publications
(49 citation statements)
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“…The resistivity decreases as temperature goes down, and reaches, at around 40 K, a low residual value of $0:005-0:009 m, which corresponds to a conductivity about 10 3 times larger than the Mott minimum metallic conductivity $e 2 =@a (the distance between atoms in diamond a $ 1:5 # A). The residual resistivity is much lower than that of often reported resistivity values of microcrystalline and/or nanocrystalline diamond films [22][23][24][25] synthesized with microwave plasma-assisted chemical vapor deposition (MPCVD) method, suggesting good intergrain contacts. Our HDD thick layers were directly deposited on top of the insulating UDD ''substrates,'' and thus no seeding with undoped nanodiamonds was employed to promote the diamond nucleation as in MPCVD.…”
mentioning
confidence: 74%
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“…The resistivity decreases as temperature goes down, and reaches, at around 40 K, a low residual value of $0:005-0:009 m, which corresponds to a conductivity about 10 3 times larger than the Mott minimum metallic conductivity $e 2 =@a (the distance between atoms in diamond a $ 1:5 # A). The residual resistivity is much lower than that of often reported resistivity values of microcrystalline and/or nanocrystalline diamond films [22][23][24][25] synthesized with microwave plasma-assisted chemical vapor deposition (MPCVD) method, suggesting good intergrain contacts. Our HDD thick layers were directly deposited on top of the insulating UDD ''substrates,'' and thus no seeding with undoped nanodiamonds was employed to promote the diamond nucleation as in MPCVD.…”
mentioning
confidence: 74%
“…Localized bosonic islands, absorbing ''metallic'' fermions [ Fig. 1(b), panel (2)], are thus responsible for the metalbosonic insulator transition at T c (local) with embedded localized superconducting islands [24,25]. With decreasing temperatures bosonic islands continue to grow [ Fig.…”
mentioning
confidence: 99%
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“…Boron doped silicon wafer of 0.5 mm thickness was pre-treated by aqueous colloid of an ultra-dispersed (5-10 nm) nanodiamond layer [20,21]. Chemical vapor deposition method was performed in plasma-enhanced ASTEX 6500 microwave plasma reactor.…”
Section: Formation Of B:ncd:o Filmmentioning
confidence: 99%