2020
DOI: 10.1088/2053-1591/ab8ee2
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Role of B-site cation on the structure, magnetic and dielectric properties of nanosized La0.7Sr0.3Fe1−xMxO3 (M = Mn; Co and x = 0, 0.5) perovskites

Abstract: The easiness of preparation and tailored properties of perovskite nanoparticles rendered them an important class of materials in the last decade. In this work, La 0.7 Sr 0.3 Fe 1-x M x O 3 (M=Mn, Co and x=0, 0.5) orthoferrites were synthesized using combustion method and examined using X-ray diffraction. The orthorhombic structure was clearly obvious with Pbnm space group without the need of any thermal treatment. Field emission scanning electron microscopy (FESEM) accompanied by Energy-dispersive spectros… Show more

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Cited by 12 publications
(1 citation statement)
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“…It enhances the electrical and optical properties of ZnO due to its high tenability [15] Hf-doped ZnO structures have been fabricated by different techniques. Examples of these techniques are chemical vapour deposition (CVD), physical vapour deposition (PVD), metalorganic chemical vapour deposition (MOCVD), plasma-enhanced chemical vapour deposition (PECVD), atomic layer depositions (ALD), pulsed laser deposition (PLD), atomic layer chemical vapour deposition (ALCVD), radio-frequency (RF)-magnetron sputtering, chemical bath deposition (CBD), successive ionic layer adsorption and reaction (SILAR) and sol-gel [16][17][18][19][20][21] for thin film and solid state, hydrothermal, co-precipitation, sonication, wet-chemical and sol-gel [22][23][24][25][26][27][28] for bulk materials. The Sol-gel method is one of the most common methods used in the production of nano-sized ceramic samples as well as in the production of high-quality thin films.…”
Section: Introductionmentioning
confidence: 99%
“…It enhances the electrical and optical properties of ZnO due to its high tenability [15] Hf-doped ZnO structures have been fabricated by different techniques. Examples of these techniques are chemical vapour deposition (CVD), physical vapour deposition (PVD), metalorganic chemical vapour deposition (MOCVD), plasma-enhanced chemical vapour deposition (PECVD), atomic layer depositions (ALD), pulsed laser deposition (PLD), atomic layer chemical vapour deposition (ALCVD), radio-frequency (RF)-magnetron sputtering, chemical bath deposition (CBD), successive ionic layer adsorption and reaction (SILAR) and sol-gel [16][17][18][19][20][21] for thin film and solid state, hydrothermal, co-precipitation, sonication, wet-chemical and sol-gel [22][23][24][25][26][27][28] for bulk materials. The Sol-gel method is one of the most common methods used in the production of nano-sized ceramic samples as well as in the production of high-quality thin films.…”
Section: Introductionmentioning
confidence: 99%