2017
DOI: 10.1088/1361-6528/aa8013
|View full text |Cite
|
Sign up to set email alerts
|

Role of Al doping in the filament disruption in HfO2resistance switches

Abstract: Resistance switching devices, whose operation is driven by formation (SET) and dissolution (RESET) of conductive paths shorting and disconnecting the two metal electrodes, have recently received great attention and a deep general comprehension of their operation has been achieved. However, the link between switching characteristics and material properties is still quite weak. In particular, doping of the switching oxide layer has often been investigated only for looking at performance upgrade and rarely for a … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

1
21
0
1

Year Published

2017
2017
2024
2024

Publication Types

Select...
5
2

Relationship

2
5

Authors

Journals

citations
Cited by 38 publications
(23 citation statements)
references
References 51 publications
1
21
0
1
Order By: Relevance
“…S6 . The long-term retention of the boundary conductance levels up to 10 years at elevated temperatures has been demonstrated in similar devices by the same authors in previous works 15 , 16 .…”
Section: Discussionsupporting
confidence: 72%
See 2 more Smart Citations
“…S6 . The long-term retention of the boundary conductance levels up to 10 years at elevated temperatures has been demonstrated in similar devices by the same authors in previous works 15 , 16 .…”
Section: Discussionsupporting
confidence: 72%
“…The analysed devices present a TiN/HfO 2 /Ti/TiN structure and their operation is based on a filamentary switching mechanism, according to previous papers 16 , 43 , 44 , initiated by a forming process as described in the Methods section. Conductance increase (potentiation) and decrease (depression) dynamics is characterized by pulsed measurements in a wide space of the programming parameters varying the time width and voltage amplitude (Δ t and Δ V ) of the applied pulses while keeping constant the initial state of the memory cell.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The simplicity of the simulation allows a low computational load for each device simulation, which is not possible for complex physical phenomenological models that have been developed for describing the switching mechanisms. [24,37,38] The proposed model is benchmarked to experimental results otained on bipolar HfO 2 -based RRAM devices. In particular the simulation of the following peculiar aspects of bipolar RRAM operation will be investigated: (i) the need of a preliminary forming step that brings the device from the initial resistance to a low resistance state (LRS); (ii) the possibility of partially resetting the device to a high resistance state (HRS) with a lower resistance value than the initial pre-forming one, thanks to the application of a voltage with opposite polarity with respect to forming; (iii) the occurence of a SET transition from HRS to LRS at lower absolute value of the voltage than that of forming but same polarity; (iv) the different switching dynamics of RESET and SET, featuring, respectively, gradual LRS to HRS decreases and almost vertical HRS to LRS transitions; (v) multilevel operation through tuning of RESET stop voltage and SET compliance current.…”
Section: Introductionmentioning
confidence: 99%
“…Flexible electronics are more portable and deformable in comparison with silicon-based devices [ 10 , 11 , 12 ]. However, most RRAM-based synaptic memories are composed of various inorganic materials, such as HfO x , Al 2 O 3 , and ZnO [ 13 , 14 , 15 ]. These inorganic materials usually require high temperature treatment steps with poor stretchability.…”
Section: Introductionmentioning
confidence: 99%