Robust sensing-a technique for controlling a semiconductor device production process

Abstract

This paper proposes the techniquefor increasing the robustness of fault detection by correctly detecting equipment faults based on a single indicator that is obtained $-om multiple signals instead of a single signal. The unstable conditions afthe plasma CVD system can be monitored more accurately by detecting faults using a single indicator obtained from multiple signals rather than by detecting them using a single signal. In this paper, we demonstrated that robust sensing can be effective, for the fault detection and classifcation(FDC) method in the wafir production ,process, i f a control model is used which is capable of detecting equipment conditions based on multiple factors.