The
gating of nanocrystal films is currently driven by two approaches:
either the use of a dielectric such as SiO2 or the use
of electrolyte. SiO2 allows fast bias sweeping over a broad
range of temperatures but requires a large operating bias. Electrolytes,
thanks to large capacitances, lead to the significant reduction of
operating bias but are limited to slow and quasi-room-temperature
operation. None of these operating conditions are optimal for narrow-band-gap
nanocrystal-based phototransistors, for which the necessary large-capacitance
gate has to be combined with low-temperature operation. Here, we explore
the use of a LaF3 ionic glass as a high-capacitance gating
alternative. We demonstrate for the first time the use of such ionic
glasses to gate thin films made of HgTe and PbS nanocrystals. This
gating strategy allows operation in the 180 to 300 K range of temperatures
with capacitance as high as 1 μF·cm–2. We unveil the unique property of ionic glass gate to enable the
unprecedented tunability of both magnitude and dynamics of the photocurrent
thanks to high charge-doping capability within an operating temperature
window relevant for infrared photodetection. We demonstrate that by
carefully choosing the operating gate bias, the signal-to-noise ratio
can be improved by a factor of 100 and the time response accelerated
by a factor of 6. Moreover, the good transparency of LaF3 substrate allows back-side illumination in the infrared range, which
is highly valuable for the design of phototransistors.