Ripple coarsening on ion beam-eroded surfaces

Teichmann, Marc; Lorbeer, Jan; Frost, Frank; Rauschenbach, B.

doi:10.1186/1556-276x-9-439

Cited by 42 publications

(23 citation statements)

References 36 publications

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“…At positions sufficiently far from the Al wedge, the IBS experiments show that ripples were generated on both SiO 2 and Si by the Ar ion beam sputtering without Al co-deposition. This is in accordance with earlier studies [5,7]. The surface evolution in these cases, at least in the low-fluence regime, can be described following the classical BH model [61].…”

Section: Discussionsupporting

confidence: 77%

“…The coarsening of the patterns on the Si surface is due to the simultaneous Al deposition during IBS. Such coarsening is different from previously reported coarsening with increasing sputtering time [7,9,12,[63][64][65]. Although some theoretical work has explained the coarsening based on numerical models [66,67], a model and simulation that can accurately predict the coarsening due to the impurity co-deposition remains unavailable at this time.…”

Section: Distance Dependence Of Smooth Si Morphology Treated By Obliqcontrasting

confidence: 49%

“…First, the aspect ratio of fused silica can be enhanced by leveraging the difference in the sputter yields of fused silica and Al 2 O 3 [7]. Second, to date, no work has been reported on the ion erosion of Si with Al co-deposition.…”

Section: Introductionmentioning

confidence: 99%

“…Low-energy ion beam sputtering (IBS) is a powerful bottom-up technology for generating diverse self-organized nanostructures, such as ripples and dots on different materials including amorphous SiO 2 [1][2][3][4][5][6][7], single crystalline Si [8][9][10][11][12], Ge [10,13] and Ag [14], as well as compound semiconductors GaSb [15] and InP [16]; the IBS technology offers the potential to achieve high throughput and fabrication of large areas [10,[17][18][19]. Ion beam parameters (species, incidence angle, energy, flux, etc) and substrate parameters (material, temperature, initial surface topography, etc) interact to generate the features of such nanopatterns.…”

Section: Introductionmentioning

confidence: 99%

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Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

et al. 2017

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The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO 2 ). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar + IBS with Al co-deposition was investigated on smooth SiO 2 , pre-rippled SiO 2 , and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO 2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO 2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO 2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO 2 , respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasiblazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlO x F y compounds originating mainly from the Al source.

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Section: Discussionsupporting

confidence: 77%

Section: Distance Dependence Of Smooth Si Morphology Treated By Obliqcontrasting

confidence: 49%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

et al. 2017

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“…The ion fluence was varied from 1.1 × 1017 to 1.3 × 1019 ions/cm2. They observed the coarsening process to be independent of the material used [26]. Zhou et al studied the formation of ripple using a focused ion beam (FIB)-scanning electron microscope setup using 30-keV Ga+ on the Ge(001) surface [27].…”

Section: Introductionmentioning

confidence: 99%

Investigations of ripple pattern formation on Germanium surfaces using 100-keV Ar+ ions

Sulania¹,

Agarwal²,

Husain³

et al. 2016

Nano Online

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which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.We have investigated the formation of nanoripples on the surface of germanium, Ge(100), due to the effect of 100-keV Ar+ ion irradiation. The irradiation was carried out at different incidence angles from 0° to 75° in steps of 15° with respect to the surface normal with a fixed ion fluence of approximately 3 × 1017 ions/cm2. Atomic force micrographs show an increase in surface roughness from 0.5 to 4.3 nm for the pristine sample and the sample irradiated at 60° incidence angle due to cos−1(θ ) dependence on sputtering yield. With increase in angle of incidence, there is transition observed from nanodots to aligned nanodots perpendicular to the direction of the beam. There is an increase in size of the nanostructures observed from 44 to 103 nm with angle of incidence. The formation of nanoripples initiates at an angle of θ ~ 45°.Ripple pattern formation has taken place on the Ge surface in the energy regime of 100 keV as compared to the other reports which had been carried out using very low energy ions. Raman spectra reveal that the near surface of crystalline Ge samples becomes amorphous due to interaction of Ar+ ions due to creation of defects through collision cascades.

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Medium energy ion irradiation of Ge surface - search for a better understanding of the surface nano-patterning

Kumar

Jain

Sulania

2016

Surf. Interface Anal.

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aWe report the morphological changes on Ge surfaces upon 50 keV Ar + and 100 keV Kr + beam irradiation at 60°angle of incidence. The Ge surfaces having three different amorphous-crystalline (a/c) interfaces achieved by the pre-irradiation of 50 keV Ar + beam at 0°, 30°and 60°with a constant fluence of 5 × 10 16 ions/cm 2 were further processed by the same beam at higher fluences viz. 3 × 10 17 , 5 × 10 17 , 7 × 10 17 and 9 × 10 17 ions/cm 2 to understand the mechanism of nano-scale surface patterning. The Kr + beam irradiation was carried out only on three fresh Ge surfaces with ion fluences of 3 × 10 17 , 5 × 10 17 and 9 × 10 17 ions/cm 2 to compare the influence of projectile mass on surface patterning. Irrespective of the depth of a/c interface, the nanoscale surface patterning was completely missing on Ge surface with Ar + beam irradiation. However, the surface patterning was evidenced upon Kr + beam irradiation with similar ion fluences. The wavelength and the amplitude of the ripples were found to increase with increasing ion fluence. In the paper, the mass redistribution at a/c interface, the incompressible solid flow through amorphous layer, the angular distribution of sputtering/backscattering yields and the generation of non-uniform stress across the amorphous layer are discussed, particularly in analogy with low energy experiments, to get better understanding of the mechanism of nanoscale surface patterning by the ion beams.

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Ripple coarsening on ion beam-eroded surfaces

Cited by 42 publications

References 36 publications

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

Investigations of ripple pattern formation on Germanium surfaces using 100-keV Ar+ ions

Medium energy ion irradiation of Ge surface - search for a better understanding of the surface nano-patterning

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