RF-plasma treatments of surface-conductive alkali-lead silicate glass and microchannel plate devices

D'Souza, Andrew S.; Leiphart, Shane; Pantano, Carlo G.

doi:10.1016/s0169-4332(99)00137-3

Cited by 4 publications

(4 citation statements)

References 21 publications

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“…Oxygen plasma (13.85 MHz RF discharge) and nitrogen microwave plasma (2.45 GHz discharge), both at a pressure of 30 Pa, were used at powers of 200 and 2000 W, respectively. Plasma exposure times ranged from 60 to 120 s. Although numerous papers refer to the low‐pressure plasma treatment of glass substrates, this procedure often appears to be impractical, since the density of the active species is rather low and because the maintenance of low‐pressure conditions is expensive and complex, particularly for inline processing.…”

Section: Challenges In Plasma Sciencementioning

confidence: 99%

“…Most of the work on glass surface cleaning by plasmas was done with electrical discharges generated at low pressures of between 10 −3 and 10 3 Pa in oxygen . Many other papers refer to the low‐pressure plasma treatment of glass substrates, but this procedure appears to be impractical, since the low density of the active species force longer exposure times of several minutes. On the other hand, one important advantage of low‐pressure O 2 plasma is that the dominant plasmachemical processes are relatively well understood, since these plasmas have been used extensively in the semiconductor industry.…”

Section: Challenges In Plasma Sciencementioning

confidence: 99%

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White paper on the future of plasma science for optics and glass

Šimek

Černák

Kylián

et al. 2018

Plasma Processes & Polymers

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This paper reflects on the future of low-temperature plasma science in relation to the manufacturing and novel uses of glass. The text summarizes the current state of the art on the major topics discussed, such as glass processing, optics and photonics, healthcare issues, building and fenestration applications. It also identifies several challenges that are driven by applications, and which are compatible with roadmaps for their respective industries. The frontiers of plasma science are discussed, for example, in relation to the use of plasmas as an active optical element in fast-response adaptive optics systems, optical metamaterials, and the development of next-generation nanolithography. Future demand for the successful implementation of plasma-based technologies in the glass, optics, and photonic industries will depend on further progress in plasma science. Hence, some needs and recommendations concerning both fundamental and applied plasma research are summarized.

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Section: Challenges In Plasma Sciencementioning

confidence: 99%

Section: Challenges In Plasma Sciencementioning

confidence: 99%

White paper on the future of plasma science for optics and glass

Šimek

Černák

Kylián

et al. 2018

Plasma Processes & Polymers

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“…In work [9] channels were purified of alkaline contaminations with ion-plasma treatment. But after several weeks-of-storage alkaline cations were exposed at the surface from the channel walls thickness with all negative consequences (increase in outgassing and noise level).…”

Section: Z:lt8nmmentioning

confidence: 99%

Quality of microchannel plate working surfaces

Kulov¹,

Kesaev²,

Bugulova³

et al. 2005

SPIE Proceedings

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The basic physical-and-chemical aspects of influence of microchannel plate working surface quality on a complex of parameters determining a technological level, quality and reliability of plates are considered in this paper. A radically new approach to technology consisting in directional change of composition and properties of channel wall material directly in the course ofMCP manufacturing process is presented.Technical level, quality and reliability of MCP are eventually evaluated by quality and purity of working surface including resistive-emissive layer of MCP channels and input-output faces. Working surface characteristics are in many respects responsible for MCP performances such as picture quality of electron image, gain and gain stability in longtime operation, noise characteristics (field-emission effects, ion feedback), outgassing as well as thermal stability of performance in vacuum baking degassing. Thus, working surface condition is one of the key MCP characteristics which quality enhancement can not be attained without understanding physical and chemical processes and in absence of system approach to this problem. Over a period of years regular studies of MCP working surfaces and their characteristics have been carried out in the following directions: surface relief on micro and nano-level; chemical and structural surface defects and their classification; in situ and integral diagnostics on the basic of currently available methods of surface diagnostics and studies of MCP characteristics; influence of technological factors and various methods of physical and chemical treatments on surface condition; MCP channel walls outgassing; MCP surface behavior in storage under exposure to air.The thickness of the wall between channels does not exceed 1 .0 -1 .6-tim, therefore, in terms of physics the channel wall is a thin-film element or a physical surface.The analysis made with the aid ofatomic force microscopy and other currently available physical and analytical methods [1] showed that channel wall surface of domestic and foreign MCP have bad roughness on nano-level with relief height of order 2-10 nanometer (see Fig. 1). z:lt8nmSurface with such a bad roughness has high adsorption capacity and removal of surface contaminants with regard to microrelief is of great difficulty. It should be noted that in order to attain rather low level of outgassing the first thing required is atomic smoothness ofchannel walls. Secondly, films (spots) ofany side contaminations within the limits ofO.O1 monolayer should not be available. Thirdly, channel walls (with total area of order 500 cm2) should be degassed throughout their thickness and removed in such a way that the level of the remaining outgassing would not exceed 1 017 ltorr/scm2 at room )C lIP pm Fig. 1. MCP channel surface profile seen in AFM

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“…The elemental analysis showed increases in concentration for a variety of metals, including Na, Ca, and Fe (see Table 2S in the Supporting Information). Reports have shown that electrolytes inside bulk glass can be released at the surface during plasma discharges 13. For the same reason, the LTP may cause electrolytes to leak from the wall surface of the nanoESI emitter (made from borosilicate glass) into the spray solution.…”

mentioning

confidence: 99%

Peptide Fragmentation Assisted by Surfaces Treated with a Low‐Temperature Plasma in NanoESI

2008

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Härter denn je: Wenn ein Nanoelektrospray(NanoESI)‐Emitter zuerst einem Heliumplasma ausgesetzt wurde (siehe experimentellen Aufbau), verlief die als sanfte Ionisationstechnik bekannte ESI unter merklicher Peptidfragmentierung. Das Auftreten von Fragment‐Ionen im Massenspektrum wurde der Freisetzung von Elektrolyten in die Lösung zugeschrieben. Labile Phosphatgruppen am Peptid blieben bei der Fragmentierung erhalten.

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RF-plasma treatments of surface-conductive alkali-lead silicate glass and microchannel plate devices

Cited by 4 publications

References 21 publications

White paper on the future of plasma science for optics and glass

White paper on the future of plasma science for optics and glass

Quality of microchannel plate working surfaces

Peptide Fragmentation Assisted by Surfaces Treated with a Low‐Temperature Plasma in NanoESI

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