2017
DOI: 10.1016/j.matpr.2017.10.086
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Review on different front surface modification of both n + -p-p + and p + -n-n + C- Si solar cell

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Cited by 16 publications
(8 citation statements)
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“…Recently semiconductor nanowires have attracted great attention due to their unique physical properties and potential applications in nanoelectronics, optoelectronics, and quantum electronics. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] With advances in the materials technology, highquality semiconductor nanowire have been obtained through, for instance, molecular-beam epitaxy, [18][19][20] metal-organic vapor phase epitaxy, [21][22][23] and chemical vapor deposition. [24][25][26][27][28][29] Due to their well organized crystal structures, relatively high carrier mobilities, small cross sections, and strong quantum confinement effects, III-V semiconductor nanowires have been employed to construct field-effect transistors, [30][31][32][33] infrared photodetectors, 34,35 light emission diodes, 36,37 thermal electrical devices, 38,39 laser devices, 40,41 solar cells, [42][43][44]…”
Section: Introductionmentioning
confidence: 99%
“…Recently semiconductor nanowires have attracted great attention due to their unique physical properties and potential applications in nanoelectronics, optoelectronics, and quantum electronics. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] With advances in the materials technology, highquality semiconductor nanowire have been obtained through, for instance, molecular-beam epitaxy, [18][19][20] metal-organic vapor phase epitaxy, [21][22][23] and chemical vapor deposition. [24][25][26][27][28][29] Due to their well organized crystal structures, relatively high carrier mobilities, small cross sections, and strong quantum confinement effects, III-V semiconductor nanowires have been employed to construct field-effect transistors, [30][31][32][33] infrared photodetectors, 34,35 light emission diodes, 36,37 thermal electrical devices, 38,39 laser devices, 40,41 solar cells, [42][43][44]…”
Section: Introductionmentioning
confidence: 99%
“…The absorption coefficient for SnO layer was considered from the experimental result reported by Liu et al [36] ( ) The photon flux data was fed to equation 24 from AM 1.5 irradiance standard data. R(λ) was taken from the micro textured surface reflectance data [37].…”
Section: Region Iii: Sno Layermentioning
confidence: 99%
“…texture of 3μm to 5μm created by conventional KOH-IPA alkaline etching method. The R(λ) data is extracted from the experimental graph of such texturization [19]. The absorption coefficient value of Si was taken from data published by Green et al [20].…”
Section: Collection Probability and Photo-generated Currentmentioning
confidence: 99%