Review of optical direct-write technology for semiconductor manufacturing

Abstract

Optical direct-write technology has been studied since the successful development of the micromirror-based spatial light modulators in the 1990s. It is expected to have advantages over electron beam direct-write in the viewpoints of higher productivity and common resist process with existing semiconductor manufacturing. In the 2000s, there was an effort to develop an optical direct-write system using deep ultraviolet (DUV) excimer laser and grayscale tilt micromirror devices, aiming at low-volume manufacturing of semiconductor devices. Recently, a new scheme of optical direct-write, called the digital scanner, has been demonstrated. It uses solid-state DUV laser and digitally controlled spatial light modulator. Past development activity of optical direct-write is reviewed with discussion of the merits and demerits of the proposed technological options in the new system, comparing them to past efforts.

Imaging study of phase shift spatial light modulator for digital scanner

“…Recently, Digital Scanner (DS), a high-resolution optical maskless exposure tool with a SLM (Spatial Light Modulator) and a DUV solid-state laser with wavelength of 193 or 248 nm, is being developed [1][2][3][4][5][6][7][8][9] . Because of commonality of exposure wavelength, DS has the same imaging performance with existing KrF, ArF dry and ArF immersion mask scanners.…”