Review of Cobalt Oxide (CoO) thin films prepared by various techniques

Abstract

It is reviewed that for fulfilling the demands of portable devices like phones, watches, low-cost energy storage system etc, cobalt oxides and their composite play a very promising role. Recently, nanotechnology has great application toward gay to-day life. This paper reviews the various deposition techniques for cobalt thin films such as chemical spray pyrolysis, atomic layer deposition, metal organic chemical vapor deposition, plasma atomic layer deposition, facile spray pyrolysis technique, spin coating techniques and reactive pulsed magnetron sputtering. Cobalt oxides are semiconductors and this material is very useful in electronic, optical and catalytic applications. In this review paper, various methods for formation of thin films were discussed. Number of properties such as structural, electrochemical and morphological of these prepared films was studied. It was observed that annealing temperature has great intense effect on thickness of films. This paper also discussed the characterization technique carried by researcher such as UV-spectroscopy, Fourier transform infrared spectroscopy, scanning electron microscopy, transmission electron microscopy, atomic force microscopy and high-resolution scanning electron microscopy (HRSEM). It was concluded that cobalt metallic films have great contribution toward new technological applications.