Reverse-optimization Alignment Algorithm using Zernike Sensitivity

Kim, Eugene D.; Choi, Young‐Wan; Kang, Minho; Choi, Se Chol

doi:10.3807/josk.2005.9.2.068

Cited by 29 publications

(16 citation statements)

References 1 publication

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“…In this paper we follow a nonlinear approach to solve (2). This can be realized by an optimization problem with a nonlinear merit function J [20,22] that is minimized w.r.t. the current component position…”

Section: Model Identification Stepmentioning

confidence: 99%

“…Furthermore, this limited approach is only valid within a small region around the linearization point and does not consider axes-coupling [18,19]. A nonlinear approach to the identification problem consists of constructing a merit function that needs to be minimized in order to yield the respective optical component positions [20][21][22]. The corresponding optimization problem can be minimized by standard derivative-free optimization algorithms.…”

Section: Introductionmentioning

confidence: 99%

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Predictor-corrector framework for the sequential assembly of optical systems based on wavefront sensing

Schindlbeck¹,

Pape²,

Reithmeier³

2018

Opt. Express

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Alignment of optical components is crucial for the assembly of optical systems to ensure their full functionality. In this paper we present a novel predictor-corrector framework for the sequential assembly of serial optical systems. Therein, we use a hybrid optical simulation model that comprises virtual and identified component positions. The hybrid model is constantly adapted throughout the assembly process with the help of nonlinear identification techniques and wavefront measurements. This enables prediction of the future wavefront at the detector plane and therefore allows for taking corrective measures accordingly during the assembly process if a user-defined tolerance on the wavefront error is violated. We present a novel notation for the so-called hybrid model and outline the work flow of the presented predictor-corrector framework. A beam expander is assembled as demonstrator for experimental verification of the framework. The optical setup consists of a laser, two bi-convex spherical lenses each mounted to a five degree-of-freedom stage to misalign and correct components, and a Shack-Hartmann sensor for wavefront measurements.

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Section: Model Identification Stepmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Predictor-corrector framework for the sequential assembly of optical systems based on wavefront sensing

Schindlbeck¹,

Pape²,

Reithmeier³

2018

Opt. Express

View full text Add to dashboard Cite

show abstract

“…This equation is commonly solved for D Δ using singular value decomposition technique [6]. As shown in the previous studies [4,7], this method tends to bring high accuracy to the estimation of the misalignment parameters as long as the linearity of the Zernike coefficient sensitivity to the alignment perturbation is maintained. If the misalignment range were large, the non-linearity of the Zernike sensitivity would be a major factor for the residual error after applying this method.…”

Section: Concept and Limitations Of Conventional Sensitivity Table Mementioning

confidence: 99%

Merit function regression method for efficient alignment control of two-mirror optical systems

Kim¹,

Yang²,

Lee³

et al. 2007

Opt. Express

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The precision alignment of high-performance, wide-field optical systems is generally a difficult and often laborious process. We report a new merit function regression method that has the potential to bring to such an optical alignment process higher efficiency and accuracy than the conventional sensitivity table method. The technique uses actively damped least square algorithm to minimize the Zernike coefficient-based merit function representing the difference between the designed and misaligned optical wave fronts. The application of this method for the alignment experiment of a Cassegrain type collimator of 900mm in diameter resulted in a reduction of the mean system rms wave-front error from 0.283 lambda to 0.194 lambda;, and in the field dependent wave-front error difference from +/-0.2 lambda to +/-0.014 lambda in just two alignment actions. These results demonstrate a much better performance than that of the conventional sensitivity table method simulated for the same steps of experimental alignment.

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“…One of the ways to solve this problem is to analyze the wavefront deformation regarding optical perturbations and it may be sensitivity or reversesensitivity analysis using Zernike polynomials for each field [11]. It is useful to analyze the optical system with a small field [12]. This type of analysis, however, should involve the individual analysis for each field and integrate them.…”

Section: Introductionmentioning

confidence: 99%

Wavefront Sensitivity Analysis Using Global Wavefront Aberration in an Unobscured Optical System

Joo

2012

Journal of the Optical Society of Korea

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It is very important to analyze effectively the tolerance of an optical system with high resolution as the projection lens of photolithography or as the objective lens of a microscope. We would like to find an effective assembly structure and compensators to correct aberrations through global wavefront sensitivity analysis using Zernike polynomial expansion from the field and pupil coordinates rather than from only pupil coordinates. In this paper, we introduce global wavefront coefficients by small perturbations of the optical system, and analyze the optical performance with these coefficients. From this analysis, it is possible to see how we can enlarge the tolerance through the proper assembly structure and compensators.

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Reverse-optimization Alignment Algorithm using Zernike Sensitivity

Cited by 29 publications

References 1 publication

Predictor-corrector framework for the sequential assembly of optical systems based on wavefront sensing

Predictor-corrector framework for the sequential assembly of optical systems based on wavefront sensing

Merit function regression method for efficient alignment control of two-mirror optical systems

Wavefront Sensitivity Analysis Using Global Wavefront Aberration in an Unobscured Optical System

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