2018
DOI: 10.1145/3184744
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ReveNAND

Abstract: The paradigm shift from planar (two dimensional (2D)) to vertical (three-dimensional (3D)) models has placed the NAND flash technology on the verge of a design evolution that can handle the demands of next-generation storage applications. However, it also introduces challenges that may obstruct the realization of such 3D NAND flash. Specifically, we observed that the fast threshold drift (fast-drift) in a charge-trap flash-based 3D NAND cell can make it lose a critical fraction of the stored charge relatively … Show more

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Cited by 7 publications
(3 citation statements)
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“…Logically sequential data are re-distributed into different parallel units to enhance read parallelism. Shihab et al [23] relieved the fast voltage drift problem of 3D flash by applying an elastic read reference scheme (ERR) to reduce read errors, which can decrease read latency with advanced ECC codes. Ap-proxFTL [24] considers storing data by reducing the maximal threshold voltage and by applying an approximate write operation to store error-resilient data Pletka et al [25] studied the shifts of threshold voltage distributions in 3D flash memory and proposed a new framework to manage 3D TLC flash errors for high SSD performance and lifetime.…”
Section: Related Workmentioning
confidence: 99%
“…Logically sequential data are re-distributed into different parallel units to enhance read parallelism. Shihab et al [23] relieved the fast voltage drift problem of 3D flash by applying an elastic read reference scheme (ERR) to reduce read errors, which can decrease read latency with advanced ECC codes. Ap-proxFTL [24] considers storing data by reducing the maximal threshold voltage and by applying an approximate write operation to store error-resilient data Pletka et al [25] studied the shifts of threshold voltage distributions in 3D flash memory and proposed a new framework to manage 3D TLC flash errors for high SSD performance and lifetime.…”
Section: Related Workmentioning
confidence: 99%
“…Although 3D process technology successfully enabled us to break through the scalingdown limit of conventional 2D planar NAND flash memory, 3D VNAND flash memory has encountered new challenges due to its unique 3D architecture and new flash cell structure [10][11][12][13][14][15][16][17][18][19]. For example, due to the three-dimensional (like cubic structure) block…”
Section: Introductionmentioning
confidence: 99%
“…Eng 2024, 5 organization of the 3D VNAND device, there is a strong variability in electrical characteristics between flash cells depending on their vertical locations within a block,which was not shown in 2D planar NAND device [10][11][12]14,16]. (In NAND flash memory, a page is the unit of read and write operations, and hundreds of pages (e.g., 576 pages [20]) compose a block, the unit of erase operations.)…”
Section: Introductionmentioning
confidence: 99%