RETRACTED: Application of RF magnetron sputtering for growth of AZO on glass substrate

Ghorannevis, Zohreh; Akbarnejad, E.; Elahi, A. Salar; Ghoranneviss, M.

doi:10.1016/j.jcrysgro.2016.04.062

Cited by 31 publications

(13 citation statements)

References 10 publications

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“…The FTO substrates were ultrasonically cleaned with acetone and ethanol, and dried immediately with pure nitrogen gas to remove surface contamination and achieve good adhesion of layer to substrates [14]. The sputter chamber was evacuated to a high vacuum of 8 9 10 -6 Torr by the assistance of rotary and turbo pumps.…”

Section: Methodsmentioning

confidence: 99%

Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

et al. 2016

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Cadmium sulfide (CdS) thin films are deposited on the fluorine doped tin oxide coated glass substrate using the radio frequency magnetron sputtering setup. The effects of annealing in air on the structural, morphological, and optical properties of CdS thin film are studied. Optimal annealing temperature is investigated by annealing the CdS thin film at different annealing temperatures of 300, 400, and 500°C. Thin films of CdS are characterized by X-ray diffractometer analysis, field emission scanning electron microscopy, atomic force microscopy, UV-Vis-NIR spectrophotometer and four point probe. The as-grown CdS films are found to be polycrystalline in nature with a mixture of cubic and hexagonal phases. By increasing the annealing temperature to 500°C, CdS film showed cubic phase, indicating the phase transition of CdS. It is found from physical characterizations that the heat treatment in air increased the mean grain size, the transmission, and the surface roughness of the CdS thin film, which are desired to the application in solar cells as a window layer material.

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Section: Methodsmentioning

confidence: 99%

Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

et al. 2016

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“…For example, cost effective solar cells based on Cu (In,Ga)Se 2 (CIGS) and Cu 2 ZnSnS 4 (CZTS) absorbers have been fabricated with a TCO based on AZO [6,7]. There are several methods used to deposit AZO, including physical vapor deposition (under various operation conditions for magnetron sputtering, such as radio-frequency [8][9][10][11][12][13][14][15][16][17][18][19][20], medium-frequency [8,[21][22][23][24][25][26], DC [8,16,22,[26][27][28][29][30][31][32][33][34][35][36][37], pulsed DC [38], high power impulse [39,40], ion beam assisted [41], chemical vapor deposition [1,5] and other chemical methods such as spin coating and sol gel [2,4]. Among them, magnetron plasma sputtering has been successfully used to deposit ITO on large area substrates (up to 15 m 2 ) and is also regarded as a viable and cost effective solution for AZO …”

Section: Introductionmentioning

confidence: 99%

Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating

Stamate

2019

Nanomaterials

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Transparent and conducting thin films were deposited on soda lime glass by RF magnetron sputtering without intentional substrate heating using an aluminum doped zinc oxide target of 2 inch in diameter. The sheet resistance, film thickness, resistivity, averaged transmittance and energy band gaps were measured with 2 mm spatial resolution for different target-to-substrate distances, discharge pressures and powers. Hall mobility, carrier concentration, SEM and XRD were performed with a 3 mm spatial resolution. The results reveal a very narrow range of parameters that can lead to reasonable resistivity values while the transmittance is much less sensitive and less correlated with the already well-documented negative effects caused by a higher concentration of oxygen negative ions and atomic oxygen at the erosion tracks. A possible route to improve the thin film properties requires the need to reduce the oxygen negative ion energy and investigate the growth mechanism in correlation with spatial distribution of thin film properties and plasma parameters.

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“…In the field of OPV applications, the requested TCO can be obtained using methods such as RF magnetron sputtering, oxygen ion beam-assisted deposition, spray chemical vapor deposition (CVD), PLD, and spray pyrolysis [22][23][24][25][26].…”

Section: Introductionmentioning

confidence: 99%

Laser Prepared Thin Films for Optoelectronic Applications

Socol¹,

Socol²,

Preda³

et al. 2017

Nanoscaled Films and Layers

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Laser techniques such as pulsed laser deposition, combinatorial pulsed laser deposition, and matrix-assisted pulsed laser evaporation were used to deposit thin films for optoelectronic applications. High-quality transparent conductor oxide films ITO, AZO, and IZO were deposited on polyethylene terephthalate by PLD, an important experimental parameter being the target-substrate distance. The TCO films present a high transparency (>95%) and a reduced electrical resistivity (5 × 10 −4 Ωcm) characteristics very useful for their integration in the flexible electronics. In x Zn 1−x O films with a compositional library were obtained by CPLD. These films are featured by a high optical transmission (>95%), the lowest resistivity (8.6 × 10 −4 Ωcm) being observed for an indium content of about 44-49 at.%. Organic heterostructures based on arylenevinylene oligomers (P78 and P13) or arylene polymers (AMC16 and AMC22) were obtained by MAPLE. In the case of ITO/P78/Alq3/Al heterostructures, a higher current value is obtained when the film thickness increases. Also, a photovoltaic effect was observed for heterostructures based on AMC16 or AMC22 deposited on ITO covered by a thin layer of PEDOT:PSS. Due to their optical and electrical properties, such organic heterostructures can be interesting for the organic photovoltaic cells (OPV) applications.

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RETRACTED: Application of RF magnetron sputtering for growth of AZO on glass substrate

Cited by 31 publications

References 10 publications

Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating

Laser Prepared Thin Films for Optoelectronic Applications

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