Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation

Guo, Ningqun; Choi, B. C.; Holfeld, Christian; Ngow, Yee Ta; Tan, Sia Kim; Tchikoulaeva, Anna; Gn, Fang Hong

doi:10.1117/12.898801

SPIE Proceedings

2011

DOI: 10.1117/12.898801

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Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation

Ningqun Guo

B. C. Choi

Christian Holfeld

et al.

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Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation

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