2007
DOI: 10.1143/jjap.46.6463
|View full text |Cite
|
Sign up to set email alerts
|

Retention Reliability Improvement of Silicon–Oxide–Nitride–Oxide–Silicon Nonvolatile Memory with N2O Oxidation Tunnel Oxide

Abstract: A reverse-tilt-domain boundary wall in a polymer-encapsulated nematic liquid crystal was examined. A boundary wall in which the liquid crystal director was nearly planar midway through the wall was formed during UV polymerization; it remained stable even though the liquid crystal molecules in neighboring domains are nearly vertically aligned. The formation of the boundary wall was found to be suppressed by the oblique irradiation with linearly polarized UV light. #

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2012
2012
2014
2014

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 19 publications
0
1
0
Order By: Relevance
“…The reason may be the surface roughness. A rough surface can reportedly induce interface states, lowering the interface barrier [37][38][39][40]. Consequently, the leakage current can be enhanced at a rough surface but not at a smooth one.…”
Section: Electrical Characteristics Of Fluorinated Gd 2 O 3 -Nc Flash...mentioning
confidence: 99%
“…The reason may be the surface roughness. A rough surface can reportedly induce interface states, lowering the interface barrier [37][38][39][40]. Consequently, the leakage current can be enhanced at a rough surface but not at a smooth one.…”
Section: Electrical Characteristics Of Fluorinated Gd 2 O 3 -Nc Flash...mentioning
confidence: 99%