Plasma deposition of catalytic thin films is reviewed in view of highlighting some interesting features. Plasma sputtering, plasma enhanced chemical vapor deposition and plasma enhanced metalorganic chemical vapor deposition and their preferential use in various kind of catalytic films are described. Fuel cell electrodes, gas sensors and photocatalytic films are emphasized as significant applications. As example, magnetron sputtering deposition is successfuly used for growing fuel cell electrodes with high performances. Doping doped TiO2 photocatalysts are deposited using various kind of plasma depending on the expected film morphology. Gas sensors are well designed when using plasma deposition. Plasma treatment of catalysts offers a suitable altertive to thermal treatments. Finally, associated simulations, especially recent progress in molecular dynamics simulations of catalytic films growth are surveyed. This is a suitable way to understand basic mechanisms of catalytic film growth.