Response mechanisms of different antibiotic-resistant bacteria with different resistance action targets to the stress from photocatalytic oxidation

Liu, Yongjie; Cai, Yiwei; Li, Guiying; Wang, Wanjun; Wong, Po Keung; An, Taicheng

doi:10.1016/j.watres.2022.118407

Cited by 38 publications

(7 citation statements)

References 68 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…However, the effect of electrochemical AOPs on bacterial antibiotic-resistant phenotypes has been poorly investigated so far. 29,31,32 We hypothesized that certain ARB with different antibioticresistant phenotypes would show different viability in the disinfection processes. It was proven that ARB induced global regulators through the expression of ARGs in photocatalytic process, which mediated the oxidative stress response via a cross-protection mechanism.…”

Section: Introductionmentioning

confidence: 99%

“…Therefore, these antibiotic-resistant phenotypes and their corresponding genotypes (mostly ARGs) were focused in this work. However, the effect of electrochemical AOPs on bacterial antibiotic-resistant phenotypes has been poorly investigated so far. ,, We hypothesized that certain ARB with different antibiotic-resistant phenotypes would show different viability in the disinfection processes.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Multiple Antibiotic-Resistant Bacteria Resistant to Electrochemical Disinfection with Variation of Key Antibiotic Resistance Genes

Jiang

Liu

et al. 2023

ACS EST Water

View full text Add to dashboard Cite

Electrochemical disinfection (ED) is effective in removal of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs) during wastewater treatment. However, the inner relationship of antibiotic-resistant phenotypes with their genotypes of ARB is still unclear in the ED process. This study explored the disinfection mechanism at the microcosmic level using four Escherichia coli (E. coli) strains with different antibioticresistant phenotypes. Results showed that bacteria with multiple antibiotic resistance tended to have stronger viability in disinfection compared with those resistant to fewer antibiotics. Interestingly, antibiotic-resistant phenotypes changed little in the disinfection process, while genotypes closely responded to bacterial resistance of different E. coli. In detail, beta-lactamase resistance genes played a leading role in the cross-resistance between antibiotics and electrochemical oxidation. They were proved to reduce oxidative destruction by increasing the strength of the cell wall and membrane. In addition, diaminopyrimidine and macrolide-lincosamide-streptogramin B resistance genes are also closely related to the bacterial resistance to ED. Combined with the quantitative determination of ARGs, the abundance of IntI1 and aminoglycoside resistance genes can be regarded as indicators for the risk of cross-resistance to antibiotics and electrochemical oxidation. This study provided important references for in depth understanding and accurate control of antibiotic resistance with advanced oxidation processes.

show abstract

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Multiple Antibiotic-Resistant Bacteria Resistant to Electrochemical Disinfection with Variation of Key Antibiotic Resistance Genes

Jiang

Liu

et al. 2023

ACS EST Water

View full text Add to dashboard Cite

show abstract

“…These reactive halogen species can react with natural organic matter to form disinfection byproducts, which are cytotoxic and genotoxic [22]. Furthermore, some advanced oxidation processes (e.g., photocatalytic oxidation, ultraviolet/peroxymonosulfate) require illumination [23,24], which faces the challenge of penetration through the thickness of wastewater. The main drawback of biodegradation is that the reduction of azo dyes usually generates aromatic amines [25], which cannot be degraded and function as biotoxins.…”

Section: Introductionmentioning

confidence: 99%

Adsorption Mechanism of Methylene Blue on Purified Red Phosphorus and Effects of Different Temperatures on Methylene Blue Desorption

Chen,

Sun,

Jiang

et al. 2023

Water

View full text Add to dashboard Cite

Purified red phosphorus (RP) can be used as an adsorbent. However, the adsorption mechanism and reuse ability of purified RP have not been reported. This study utilized X-ray diffraction, Fourier transform infrared spectroscopy and scanning electron microscopy techniques (a statistical physics model and the standard molar free energy of formation) to investigate the adsorption mechanism of methylene blue (MB) by purified RP. Purification did not change commercial RP structure according to X-ray diffraction. The results showed that the adsorption process only included physical adsorption according to Fourier transform infrared spectroscopy and UV–vis diffuse reflection absorption spectra. The specific areas of commercial RP and purified RP were 0.02 cm3/g and 5.27 cm3/g, respectively. Thus, purified RP has a higher adsorption capacity compared with commercial RP. A statistical physics model showed that, as the temperature increased from 288 to 308 K, the qe, Dm and qsat of purified RP for MB increased from 179.87, 0.824 and 0.824 to 303.26 mg/g, 1.497 mol/kg and 1.497 mol/kg, respectively. The fitted values of ΔrSmθ, ΔrHmθ and ΔrGmθ were 104.38 J·mol−1·K−1, −2.7 × 103 J·mol−1 and negative, respectively. Thus, according to adsorption energy, the adsorption of MB by purified RP was a spontaneous process, which was mainly driven by entropy increasing. Compared with neutral dye, the purified RP had higher adsorption ability for the cationic dye and anionic dye. As the purified RP dose increased from 30 to 150 mg, the adsorption capacity of purified RP increased. However, as the MB concentration and pH increased, the adsorption capacity of purified RP decreased. The purified RP had excellent reuse ability and high temperature desorption can be applied to obtain its reuse ability.

show abstract

“…In addition, the selective pressure of antibiotic abuse on microbial communities will eventually lead to the rapid reproduction and spread of antibiotic resistance genes (ARGs) and antibiotic resistant bacteria (ARB) [6]. It is also unfortunate that most current antibiotics do not have a strong DNA-damaging capacity to prevent the spread of ARGs and ARB [7]. Therefore, it is imperative to develop a "one-stop" treatment technology to simultaneously remove antibiotics and biological pollutants in the water while minimizing their damage to the ecological environment and human health.…”

Section: Introductionmentioning

confidence: 99%

Metal-free graphitic carbon nitride/black phosphorus quantum dots heterojunction photocatalyst for the removal of ARG contamination

Zhang

Li³

et al. 2023

Adv Compos Hybrid Mater

View full text Add to dashboard Cite

Antibiotic resistant bacteria (ARB) and genes (ARGs) have become hot topics in the eld of water puri cation. In this paper, graphite carbon nitride (g-C 3 N 4 ) and black phosphorus quantum dots (BPQDs) were used as raw materials to fabricate a non-metallic heterojunction composite photocatalyst (H-g-C 3 N 4 /BPQDs) by hydrothermal impregnation, high-temperature calcination, and ice-assisted ultrasound.The H-g-C 3 N 4 /BPQDs was used to remove antibiotics and biological pollution from water under visible light irradiation. Based on the porous structure and high speci c surface area of H-g-C 3 N 4 , the the obtained type II heterojunction structure promoted the absorption of visible light, accelerated the interfacial charge transfer, and inhibited the recombination of photogenerated electron-hole pairs. Under visible light irradiation, the degrading e ciency of TC by H-g-C 3 N 4 /BPQDs exceeded 91% in 30 min, and E. coli K12 M1655 can be completely inactivated in 4 h. In addition, the maximum inactivation rate of H-g-C 3 N 4 /BPQDs for E. coli HB101(RP4) was 99.99% in 4 h, and the degradation e ciency of RP4 was more than 85%. This study provides not only a new idea for the design of green g-C 3 N 4 -based non-metallic heterojunction photocatalysts but also a broad prospect for the application of g-C 3 N 4 -based photocatalysts for the removal of ARGs in water treatment.

show abstract

Response mechanisms of different antibiotic-resistant bacteria with different resistance action targets to the stress from photocatalytic oxidation

Cited by 38 publications

References 68 publications

Multiple Antibiotic-Resistant Bacteria Resistant to Electrochemical Disinfection with Variation of Key Antibiotic Resistance Genes

Multiple Antibiotic-Resistant Bacteria Resistant to Electrochemical Disinfection with Variation of Key Antibiotic Resistance Genes

Adsorption Mechanism of Methylene Blue on Purified Red Phosphorus and Effects of Different Temperatures on Methylene Blue Desorption

Metal-free graphitic carbon nitride/black phosphorus quantum dots heterojunction photocatalyst for the removal of ARG contamination

Contact Info

Product

Resources

About