“…Both systems are also strongly related to more fundamental research structures developed in the last years, like in-plane-gate transistors [6], single-electron transistors [7], silicon-on-insulator planar double-gate transistors [8], non-planar double-gate FinFETs [9], non-planar trigate transistors [10], nanowire-based fieldeffect transistors (FET) [11], nanowire resonant tunneling diodes [12,13], nanowire lasers [14], or nanowire qubits [15], whose maturity has still to be proven for industrial applications. Their structural complexity has also progressively increased, allowing for double-barrier structures [12,13], or multiple core-shell layers [14,16]. The material composition includes mainly III-V materials GaAs/AlGasAs [6,7,13], InAs/InP [12], GaN/InGaN [14], but also group IV materials Si [4,17], and Si/Ge [11,15], predominant in the industry.…”