2011
DOI: 10.1051/epjap/2011110235
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Resonant photoemission of rare earth doped GaN thin films

Abstract: Abstract. The 4d → 4f Fano resonances for various rare earth doped GaN thin films (RE = Gd, Er, Yb) were investigated using synchrotron photoemission spectroscopy. The resonant photoemission Fano profiles show that the major Gd and Er rare earth 4f weight is at about 5-6 eV below the valence band maximum, similar to the 4f weights in the valence band of many other rare earth doped semiconductors. For Yb, there is very little resonant enhancement of the valence band of Yb doped GaN, consistent with a largely 4f… Show more

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Cited by 5 publications
(18 citation statements)
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References 56 publications
(86 reference statements)
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“…As previously described, the RE x Ga 1-x N thin films (50-300 nm) were fabricated on Si(111) (RE = Yb, Gd) and sapphire, Al 2 O 3 (RE = Er) substrates by RF plasma (EPI 620) assisted molecular beam epitaxy (MBE) [23,31]. The growth parameters for the deposition of RE-doped (in situ) GaN thin films were a base pressure of ∼ 10 −11 Torr, nitrogen flux of 0.75-1.0 SCCM (Yb, Gd) and 2.0 SCCM (Er), RF power of 500 W, substrate temperature of 850-900 • C, Ga cell temperature of 850 • C and RE cell temperatures of 500-850 • C (Yb), 1000-1100 • C (Er) and 1050-1100 • C (Gd).…”
Section: Methodsmentioning
confidence: 99%
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“…As previously described, the RE x Ga 1-x N thin films (50-300 nm) were fabricated on Si(111) (RE = Yb, Gd) and sapphire, Al 2 O 3 (RE = Er) substrates by RF plasma (EPI 620) assisted molecular beam epitaxy (MBE) [23,31]. The growth parameters for the deposition of RE-doped (in situ) GaN thin films were a base pressure of ∼ 10 −11 Torr, nitrogen flux of 0.75-1.0 SCCM (Yb, Gd) and 2.0 SCCM (Er), RF power of 500 W, substrate temperature of 850-900 • C, Ga cell temperature of 850 • C and RE cell temperatures of 500-850 • C (Yb), 1000-1100 • C (Er) and 1050-1100 • C (Gd).…”
Section: Methodsmentioning
confidence: 99%
“…Atomically clean GaN:RE surfaces were obtained by several preparatory cycles of Ar + ion sputtering and annealing, as described elsewhere [23,31,32]. This will create a number of point defects, but photoemission is generally insensitive to such defects.…”
Section: Methodsmentioning
confidence: 99%
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