Abstract:Traditional optical lithography uses semitransparent single-layer resists where the exposing radiation produces a latent image throughout the thickness of the resist, and an isotropic liquid-based development step is used to create the desired resist profile. However, resolution of 0.25-μm or better, which is required for 256 Mbit DRAM chips and beyond, cannot be obtained with conventional photolithographic technology (250-400 nm wavelength). Shorter wavelengths are required, such as 193-nm (DUV-193), soft-X- … Show more
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