Residue analysis of thermally depolymerized phthalaldehyde‐based polymer thin films

Abstract

In this study, thermolysis of poly(phthalaldehyde), pPHA, was investigated, and the nonvolatile residues produced were characterized by bulk and surface analyses to provide insight into its use as a resist material for thermal scanning probe lithography. A temperature of 300°C for a short time was required to remove nearly all of the residue produced from pPHA depolymerization. X‐ray photoelectron spectroscopy (XPS) was used to quantify the trace amount of hydrocarbon residue after thermolysis. Time‐of‐flight secondary ion mass spectrometry (SIMS) results show that the residue is largely PHA monomers and oligomers, but also include hydrocarbon char. Differences in molecular weight and composition of the residue as a function of copolymer composition were investigated to give insight into designing new thermal resist materials.

Chemical recycling of polymer composites induced by selective variable frequency microwave heating

“…-36 C. 34,35 The depolymerization products are almost exclusively o-phthalaldehyde monomer with a small amount of other byproducts that depend on the chemistry of the local environment. 36 Therefore, selective VFM heating of the PPA composites is expected to cleanly revert the polymer back to recoverable monomer.…”

Photoactivated Cyclic Polyphthalaldehyde Microcapsules for Payload Delivery

“…Depolymerization of cPPA causes the polymer to spontaneously revert back to its monomer, o-phthalaldehyde (oPA). cPPA depolymerization can be triggered by elevated temperature, 26,27 acid, 28,29 single electron transfer, 30 or mechanical force. 31 PPA has been used in the microcapsule shell because the polymer can be easily depolymerized to release the core.…”