Residual stress analysis in thick uranium films

Abstract

Residual stress analysis was performed on thick, 1-25 lm, depleted uranium (DU) films deposited on an Al substrate by magnetron sputtering. Two distinct characterization techniques were used to measure substrate curvature before and after deposition. Stress evaluation was performed using the Benabdi/Roche equation, which is based on beam theory of a bi-layer material. The residual stress evolution was studied as a function of coating thickness and applied negative bias voltage (0, À200, À300 V). The stresses developed were always compressive; however, increasing the coating thickness and applying a bias voltage presented a trend towards more tensile stresses and thus an overall reduction of residual stresses.

Residual Stress Measurement for Coated Film on Cold Work Tool Steel

“…In case of AlCrN, even though coating at the highest temperature, the compressive residual stress measured is rather low (-3.52 GPa). This can be explained by relatively thick film, the stresses changed to a tensile residual stress due to the intrinsic stress effect, the stress becomes less compressive [8,15,18]. By comparing the surface morphologies of the film along scratch tracks as shown in Fig.…”