“…A literature review showed that ammonium fluorides can be considered as the main reagents for processing chemically stable oxides and other oxygen-containing compounds. Well known is the use of a melt of ammonium fluorides as a reagent for processing the most chemically stable oxygen-containing compounds and also minerals (tantalite, 11 laterite, 12 monazite, 13 spodumene, 14 trinitite, 15,16 zircon, [17][18][19][20][21][22] ilmenite, 23 titanomagnetite, 24,25 polymetallic slags, 26 etc.) and pure oxides (plutonium dioxide, 27 thorium dioxide, 28 lanthanum, neodium and gadolinium, 29 etc.).…”
BACKGROUND: Despite the large reserves of titanium ores, their treatment by basic approaches to obtain titanium products is not always economically feasible due to various factors. One of these problems is the high content of silicon in the ores.
RESULTS:The paper considers the desiliconization of a leucoxene concentrate with an aqueous solution of ammonium bifluoride. It was found that at 80 °C the main impurities, such as silicon and iron, pass into solution in the form of corresponding ammonium-fluorine complex compounds.CONCLUSIONS: The degree of desiliconization was up to 99%. Aluminium reacts with ammonium bifluoride, but is almost not leached into solution due to its low solubility. Titanium does not react due to its relatively higher reaction Gibbs energy among other metals in reaction with ammonium bifluoride. The content of titanium oxide in the calcined leaching residue was 85.52 wt%. The resulting residue corresponds to the raw material used in industry for the production of titanium dioxide pigment or titanium metal by the chlorine method. Iron and silicon can be precipitated from the leaching solution. Furthermore, the resulting filtrate can be evaporated in order to regenerate and reuse ammonium bifluoride.
“…A literature review showed that ammonium fluorides can be considered as the main reagents for processing chemically stable oxides and other oxygen-containing compounds. Well known is the use of a melt of ammonium fluorides as a reagent for processing the most chemically stable oxygen-containing compounds and also minerals (tantalite, 11 laterite, 12 monazite, 13 spodumene, 14 trinitite, 15,16 zircon, [17][18][19][20][21][22] ilmenite, 23 titanomagnetite, 24,25 polymetallic slags, 26 etc.) and pure oxides (plutonium dioxide, 27 thorium dioxide, 28 lanthanum, neodium and gadolinium, 29 etc.).…”
BACKGROUND: Despite the large reserves of titanium ores, their treatment by basic approaches to obtain titanium products is not always economically feasible due to various factors. One of these problems is the high content of silicon in the ores.
RESULTS:The paper considers the desiliconization of a leucoxene concentrate with an aqueous solution of ammonium bifluoride. It was found that at 80 °C the main impurities, such as silicon and iron, pass into solution in the form of corresponding ammonium-fluorine complex compounds.CONCLUSIONS: The degree of desiliconization was up to 99%. Aluminium reacts with ammonium bifluoride, but is almost not leached into solution due to its low solubility. Titanium does not react due to its relatively higher reaction Gibbs energy among other metals in reaction with ammonium bifluoride. The content of titanium oxide in the calcined leaching residue was 85.52 wt%. The resulting residue corresponds to the raw material used in industry for the production of titanium dioxide pigment or titanium metal by the chlorine method. Iron and silicon can be precipitated from the leaching solution. Furthermore, the resulting filtrate can be evaporated in order to regenerate and reuse ammonium bifluoride.
“…However, films obtained from the SnCl 4 /EtOH/NH 4 F system display an increase in surface resistance by multiple magnitudes after 3 h of annealing. It is assumed that when films formed utilizing NH 4 F-containing film-forming systems are developed, certain fluorine ions can become part of the film structure by adhering to tin ions, while others develop separate NH 4 F crystallites which decompose in two stages upon being heated[35,36].1 st stage. At 167 ºC, ammonium fluoride decomposes into gaseous ammonia (NH 3 ) and ammonium hydrofluoride (NH 4 HF 2 ) according to the reaction:…”
This study investigates the effects of annealing time on the optical and electrical properties of tin dioxide coatings, specifically surface resistivity and specific conductivity. The thickness of the film, as well as its density and void density, were calculated from the interference peaks. The results suggest that as the duration of annealing increases, the density of the film decreases and the void volume increases. The lack of interference peaks in the transmission spectra of films containing additives is caused by the development of dendritic structures within the films. As the annealing duration is extended to 6 h, the surface resistivity increases, resulting in a decrease in the specific conductivity of all films. As the duration of annealing increases, the surface resistivity of the films studied increases and therefore their overall quality decreases.
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