Research of Cr 2 O 3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices

Hong, Dunpin; Wang, Xiang D.; Liu, Yuan

doi:10.1117/12.47262

International Conference on Thin Film Physics and Applications 1991

DOI: 10.1117/12.47262

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Research of Cr 2 O 3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices

Dunpin Hong

Xiang D. Wang²,

Yuan Liu³

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Research of Cr 2 O 3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices

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