2010
DOI: 10.3788/hplpb20102208.1705
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Research of anti-reflective and protective DLC Film on Si Substrate by Femto-second Pulsed Laser Deposition

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Cited by 3 publications
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“…By using double cathode hollow cathode discharge, the working carrier gas of hydrocarbon is activated and dissociated to form a high density plasma, which has many efforts in deposit on diamond film or surface modification for the diamond film. The Xu-Tec can be employed as the metallization method of preparing W metallic coatings and Ta x C interlayer onto CVD diamond films [54] . In recent years, the application of Xu-Tec process in diamond has following three aspects:…”
Section: Application Of Double Glow Plasma Technology In Diamond Filmmentioning
confidence: 99%
“…By using double cathode hollow cathode discharge, the working carrier gas of hydrocarbon is activated and dissociated to form a high density plasma, which has many efforts in deposit on diamond film or surface modification for the diamond film. The Xu-Tec can be employed as the metallization method of preparing W metallic coatings and Ta x C interlayer onto CVD diamond films [54] . In recent years, the application of Xu-Tec process in diamond has following three aspects:…”
Section: Application Of Double Glow Plasma Technology In Diamond Filmmentioning
confidence: 99%