Research into the Disintegration of Abrasive Materials in the Abrasive Water Jet Machining Process

Perec, Andrzej

doi:10.20944/preprints202106.0548.v1

Cited by 14 publications

(2 citation statements)

References 16 publications

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“…The high flash point temperature during tribochemical mechanical polishing will stimulate the occurrence of the above formula (3) -(5) [41]. On the other hand, the flash point temperature during polishing will also promote the reaction between water molecules and oxygen in the air and Cr2O3, as shown in formula (6). In formula ( 6), OHionized by the product absorbing water molecules in the air and silicon bond suspended in silicon carbide will undergo tribochemical reaction [42,43], the reaction is shown in formula (7).…”

Section: Sic+2o2→sio2+co2↑mentioning

confidence: 99%

“…Chemical mechanical polishing is a technology to realize ultra-precision machining [4,5]. Abrasive plays a very important role in chemical mechanical polishing, and often were used in the processing of semiconductor materials, aerospace and other fields [6][7][8]. In recent years, many scholars have studied different abrasives, such as magnetic abrasives, mixed abrasives, polycrystalline diamond abrasives etc [9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%

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Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Wang

Ding²,

Wang³

et al. 2023

Preprint

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Abrasive particles have a crucial influence on the material removal rate and surface quality of the workpiece in tribochemical mechanical polishing. Therefore, this article selects a self-made catalytic abrasive cluster to polish the 6H-SiC and explore the removal mechanism of polishin silicon carbide in the new catalytic abrasive cluster. The tribochemical mechanical polishing test and friction and wear test of 6H-SiC were carried out with three different abrasives, and the evaluation parameters such as material removal rate, surface roughness and friction coefficient were obtained. Quanta 200 scanning electron microscope(SEM) and oxfobrdinca 250 energy dispersive spectrometer (EDS) and x-ray diffraction(XRD)diffractometer were used to observe the surface, analyze the elements and determine the composition of silicon carbide workpiece after tribochemical mechanical polishing. The experimental result shows that oxygen is produced in the tribochemical mechanical polishing of silicon carbide by catalytic abrasive cluster, which makes the silicon carbide surface generate SiO2 shear film that is easy to be removed. Comparing with iron-based white corundum mixed abrasive and Al2O3 abrasive, the catalytic abrasive cluster has better processability for 6H-SiC, and the material removal rate can reach to 42.928nm/min.

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Section: Sic+2o2→sio2+co2↑mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Wang

Ding²,

Wang³

et al. 2023

Preprint

View full text Add to dashboard Cite

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Experimental Study on Dispersion Stability and Polishing Performance of Polishing Solution Based on Micro-Abrasive Water Jet Polishing

Lin,

Jiang,

Zhang

et al. 2024

Applied Sciences

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In micro-abrasive water jet polishing (MAWJP) technology, where abrasive particles serve as polishing tools, particles tend to form large clusters, leading to increased nozzle wear and diminished material polishing quality. Achieving a polishing solution with good dispersion stability is crucial for enhancing polishing accuracy and minimizing nozzle wear. Therefore, this study employed three dispersants with distinct dispersion mechanisms to examine the impact of each dispersant’s concentration on the dispersion stability of the polishing solution across various abrasive concentrations. Through experimentation, the optimal dispersant type and concentration ratio of abrasive to dispersant were determined, and the effect of the selected dispersant on jet polishing performance was validated. The results of the dispersion stability experiment indicated that, in comparison to Na(PO3)6 and polyethylene glycol (PEG), the polishing solution containing 1.0–2.0 wt% phosphoric ester compounds exhibited a more stable dispersion effect (zeta potential < −50 mV) and superior dispersibility, characterized by a smaller average particle size. Furthermore, K9 optical glass was subjected to fixed-point and local polishing using phosphoric ester compounds as the dispersant. The fixed-point polishing experiment revealed that, at a dispersant concentration of 1.0 wt% and an abrasive concentration of 20 wt%, a smooth and symmetrical material removal profile could be achieved. In the local polishing experiment, the reduction rate of the root mean square of the surface roughness (RMS) increased from 54.33% to 82.24%, and the reduction rate of peak-to-valley height difference in surface (PV) increased from 38.84% to 68.97%. In conclusion, the incorporation of a dispersant proves effective in enhancing the dispersion stability of the polishing solution and dispersibility of the abrasive particles, thereby improving the surface quality of the materials in MAWJP.

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Application of RSM Method for Optimization of Geraniol Transformation Process in the Presence of Garnet

Fajdek-Bieda

Perec

Radomska-Zalas

2023

IJMS

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This paper presents the results of tests obtained for the transformation of geraniol in the presence of garnet as a catalyst by the response surface method (RSM). The method analyzed the influence of the following parameters: a temperature of 50–150 °C, a catalyst concentration (garnet) of 1.0–10.0 wt% and a reaction time of 0.25–24 h. Response functions included the conversion of geraniol (GA), selectivity for conversion to neral (NE) and selectivity for conversion to citronellol (CL). In addition, the influence of all control parameters on each of the response parameters is presented in the form of second-order polynomials. The optimal parameters of the geraniol transformation process were a temperature of 55 °C, a catalyst concentration of 5 wt% and a reaction time of 2 h, for which high values of the GA conversion function and the selectivity of conversion to NE and CL were obtained. For the GA conversion, the optimum was obtained at 94 mol% at 60 °C, a catalyst concentration of 5.0 wt% and a reaction time of 2 h. For NE selectivity, the optimum value was reached at 49 mol% at 60 °C, a catalyst concentration equal to 2.5 (5.0) wt% mole and a reaction time of almost 2 h. For CL selectivity, the optimum value of 49 mol% was obtained for control factors: a temperature equal to 20 °C, a catalyst concentration equal to 5.0 wt% and a response time equal to 2 h. The optimal set of control factors for all power factors is characterized by a temperature of 55 °C, a catalyst concentration of 5 wt% and a reaction time of 2 h.

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Research into the Disintegration of Abrasive Materials in the Abrasive Water Jet Machining Process

Cited by 14 publications

References 16 publications

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Experimental Study on Dispersion Stability and Polishing Performance of Polishing Solution Based on Micro-Abrasive Water Jet Polishing

Application of RSM Method for Optimization of Geraniol Transformation Process in the Presence of Garnet

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