Requirements and designs of illuminators for microlithography

Michaloski, Paul

doi:10.1117/12.563941

Cited by 8 publications

(2 citation statements)

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“…The rays in the horizontal plane are defocus showing in Figure 6. The width L of the light intensiy distribution on the reticle in the scan direction is in proportion to the disitance d, and it is expressed as θ tan 2 ⋅ = d L (4) Where, the θ is the angle of light incident on the reticle. …”

Section: Uniformizer and Relaymentioning

confidence: 99%

“…Though the illuminator does not require as tight a fabrication precision as the projection lens, it does have demanding requirements that challenge the designer 2 . Lev Ryzhikov introduced the requirements of the components in the illuminator 3 , while Paul Michaloski divided the illuminator into three parts: the beam shaping unit, the uniformizers and the relay 4 . Despite this, the peer-reviewed papers or patents on design methods for illuminator are scarce compared with those for the projection lens.…”

Section: Introductionmentioning

confidence: 99%

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Detailed illuminator design for full-field ArF lithography system with a method based on the fly's eye

Wei

Liu

2012

SPIE Proceedings

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Lithography is the key technology to semiconductor manufacture. With the rapid improvement of projection lens and resolution enhancement technique (RET), the essence of the illuminator can never be overestimated in the lithography system. However, due to various and complex components and the fact that fewer design methods were proposed in the papers compared with those of the projection lens, a detailed design method for the illuminator is needed. This paper introduces the detailed design process for the illuminator in a NA 0.75 lithography system on 90nm node. The exposure field at the reticle plane is 104mm×42mm. The illuminator mainly consists of three parts: the beam shaping unit, the uniformizer and the relay lens. In order to construct the matching relationship among the various components in the illuminator, a design method based on the fly's eye, which is the core and starting point, has been proposed. This method has been successfully used in small field lithography system. With this method, the matching relationship in the illuminator can be determined easily, and the illumination NA and size are guaranteed simultaneously. Furthermore, the detailed design for some key issues in the illuminator is given: the diffractive optical element (DOE), zoom lens and axicon are used together to generate different sources in the entrance pupil of the projection lens; the condenser design; and 1X relay with two cylinder lenses to achieve trapezoid intensity distribution in the scan direction. A demonstration simulation result is given, and the uniformity of the non-scan and scan direction reached 1.2% and 1.7% respectively under all illumination modes. The result showed good performance and the requirements of the lithography tools have been met.

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Section: Uniformizer and Relaymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%