2007
DOI: 10.1016/j.jmmm.2006.10.605
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Repair effect on patterned CoFeB-based magnetic tunneling junction using rapid thermal annealing

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Cited by 3 publications
(2 citation statements)
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“…Magnetic tunneling junctions (MTJs) have a sandwiched structure, which is composed of a top ferromagnetic (FM1) layer, an insulating tunneling layer (spacer), and a bottom ferromagnetic (FM2) layer, which can be utilized in high-density read/write heads, magnetoresistance random access memories (MRAM) and gauge sensor applications. This structure yields a very large magnetoresistance (MR) owing to spin-dependent tunneling effect [ 4 , 5 , 6 , 7 , 8 , 9 , 10 ]. Numerous factors influence the magnetoresistance, such as the indirect spin exchange-coupling of ferromagnetic layers, and the quality of the insulating tunneling layer, which affect the magnetic performance.…”
Section: Introductionmentioning
confidence: 99%
“…Magnetic tunneling junctions (MTJs) have a sandwiched structure, which is composed of a top ferromagnetic (FM1) layer, an insulating tunneling layer (spacer), and a bottom ferromagnetic (FM2) layer, which can be utilized in high-density read/write heads, magnetoresistance random access memories (MRAM) and gauge sensor applications. This structure yields a very large magnetoresistance (MR) owing to spin-dependent tunneling effect [ 4 , 5 , 6 , 7 , 8 , 9 , 10 ]. Numerous factors influence the magnetoresistance, such as the indirect spin exchange-coupling of ferromagnetic layers, and the quality of the insulating tunneling layer, which affect the magnetic performance.…”
Section: Introductionmentioning
confidence: 99%
“…The amorphous CoFeB free layer of MTJ can induce a high tunneling magnetoresistance (TMR) ratio at RT [6]. Furthermore, the amorphous CoFeB free layer of MTJ can enhance a significantly higher TMR ratio during postannealing T A = 150 • C treatment [7][8][9]. The contact angle and surface energy properties, such as amorphous, noncrystalline, and crystalline status, are associated with the crystalline degree of thin film [10,11].…”
Section: Introductionmentioning
confidence: 99%