2010 IEEE Industry Applications Society Annual Meeting 2010
DOI: 10.1109/ias.2010.5615990
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Removal of Indoor Air Contaminant by Atmospheric Microplasma

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Cited by 4 publications
(4 citation statements)
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“…As previously reported in [11], the emission spectrum from the microplasma discharge in N 2 with water vapors when a high voltage amplifier was used to energize the electrodes, showed N 2 Second Positive System (N 2 SPS) peaks at 315.9, 337.1, 357.7, 367.2, 371.1, 375.5, 380.5, 394.3 nm that were observed due to electron collision [1214], and OH peaks at 306.4 nm, 307.8 nm and 308.9 nm [15,16]. …”
Section: Resultssupporting
confidence: 75%
See 1 more Smart Citation
“…As previously reported in [11], the emission spectrum from the microplasma discharge in N 2 with water vapors when a high voltage amplifier was used to energize the electrodes, showed N 2 Second Positive System (N 2 SPS) peaks at 315.9, 337.1, 357.7, 367.2, 371.1, 375.5, 380.5, 394.3 nm that were observed due to electron collision [1214], and OH peaks at 306.4 nm, 307.8 nm and 308.9 nm [15,16]. …”
Section: Resultssupporting
confidence: 75%
“…We reported in [11] that O radicals and OH radicals are the main species which are contributing to formaldehyde removal according to reactions (10) and (11). In both cases HCO results, which furthermore reacts with HCO (reaction 25) to give formaldehyde and CO or reacts with O 2 (reaction 17) to obtain HO 2 and CO. HO 2 is decomposed according to reactions (27) and (28): HO2+OOH+O2k=4.52×1011 HO2+OHH2O+O2k=8.00×1011…”
Section: Resultsmentioning
confidence: 99%
“…Several studies have used the emission spectrum of plasma discharge in N 2 with water vapor to predict the reaction kinetics associated with the decomposition of indoor air [27][28][29][30]. It has been suggested that the decomposition process commences with the formation of OH and H radicals as a result of the electron impact dissociation of H 2 O vapor [25,31].…”
Section: Introductionmentioning
confidence: 99%
“…Microstrip split-ring resonator microwave-induced plasma sources (MSRR-MIPs) [1,2,3,4,5,6], have been proposed for integration in a wide variety of portable devices aimed for, e.g., chemical analysis systems [7,8], ion sources [9], sterilization or activation of substances [10,11]. Reasons for this are: their low power consumption, power efficiency, design simplicity, mechanical robustness, high density non-thermal plasma, long lifetime, and ability to operate at atmospheric pressure [4].…”
Section: Introductionmentioning
confidence: 99%