Removal of Fe impurities on the Si substrate using remote hydrogen plasma

Jeon, Bu-yong; Lee, Chongmu

doi:10.1016/s0254-0584(99)00190-x

Cited by 2 publications

(1 citation statement)

References 13 publications

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“…The cleaning mechanism of hydrogen plasma on metal impurities, namely copper (Cu), iron (Fe) and potassium (K), on a Si substrate has been revealed [21]. Cu, K and Fe impurity atoms which coexist with the chemical and/or native oxides on the Si wafer surface are eliminated together when the oxides are removed by hydrogen plasma [22]. However, this chemical mechanical polishing method is different from the mechanism of chemical reaction cleaning of tin by hydrogen plasma.…”

Section: Introductionmentioning

confidence: 99%

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Wang

Yang

Guo

et al. 2022

Plasma Sci. Technol.

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Self-cleaning of tin contaminants was realized utilizing self-driven hydrogen plasma. Cleaning rates of 0.7-6 nm min-1 were achieved to remove discontinuous tin particles at different powers. The analysis of topography and cross-sectional morphology revealed that the removal of tin particles was achieved through top-down cleaning with hydrogen plasma, where the upper part of spherical tin particles was always more intensely cleaned under the synergistic effect of hydrogen atoms and ions due to the vertical incidence of ions to substrate during the whole cleaning process. The redeposition of tin atoms caused by physical sputtering and its promotion of the chemical cleaning effect was observed for the first time. Reflectance recovery measurements during cleaning and surface analysis of the substrate after cleaning indicated that nondestructive cleaning with reflectance loss of less than 1% can be achieved at a relatively low power of 120 W. The plasma-induced substrate damage, such as holes and valleys, reduced the reflectance of the substrate when cleaning was performed at a high power ＞120 W, which should only be considered to apply in the condition without substrate exposed. This study provides a comprehensive understanding of the removal of discontinuous tin particles using the in-situ self-driven plasma cleaning method, which also provides meaningful guidance for the extension of this method in other potential application fields.

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Section: Introductionmentioning

confidence: 99%

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Wang

Yang

Guo

et al. 2022

Plasma Sci. Technol.

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Chrome and Zinc Contaminants Removal from Silicon (100) Surfaces by Remote Plasma Cleaning Techniques

Lee

2001

Jpn. J. Appl. Phys.

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Removal of Cr and Zn impurities on Si surfaces using remote plasma H2 was investigated. Si surfaces were contaminated intentionally with low-purity acetone. To determine the optimum process conditions, remote plasma H2 cleaning was conducted for various rf powers and plasma exposure times. After remote plasma H2 cleaning, Si surfaces were analyzed by total X-ray reflection fluorescence (TXRF), surface photovoltage (SPV) and atomic force microscopy (AFM). The concentrations of Cr and Zn impurities were reduced by more than a factor of 2 and the minority carrier lifetime increased. Also the root-mean-square (RMS) roughness decreased by more than 30% after the remote plasma H2 cleaning. TXRF analysis results show that remote plasma H2 cleaning is effective in eliminating Cr and Zn impurities from the Si surface only if it is performed under optimum process conditions. AFM analysis results also show that remote plasma H2 cleaning causes no damage to the Si surface. Cr and Zn impurities on the Si substrate are considered to be contaminated as forms of hydroxides, silioxides and oxides on chemical oxides formed during intentional chemical contamination. The removal mechanism of Cr and Zn impurities using remote plasma H2 treatments is proposed for the lift-off during the removal of underlying chemical oxides.

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Removal of Fe impurities on the Si substrate using remote hydrogen plasma

Cited by 2 publications

References 13 publications

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination

Chrome and Zinc Contaminants Removal from Silicon (100) Surfaces by Remote Plasma Cleaning Techniques

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