“…Shortly after, Kira et al showed that the isolable silylene 183 oxidatively cleaved the Si–Cl bonds of dichlorodimethylsilane, tetrachlorosilane, and dichlorosilane to give the corresponding 1,2-dichlorodisilanes 465 (Scheme ), whereas reaction with dimethylchlorosilane afforded the Si–H insertion product 466 exclusively. , DFT calculations of the reaction of SiMe 2 with chlorosilanes ClSiYR 2 (R = Me or H; Y = H, Cl, F, Me, or SiH 3 ) revealed stereoelectronic substituent effects, of which the most important is the nucleophilic interaction of the silylene lone pair with the σ* (Si–Y) orbital . The effect of the substituents at silicon on the activation energy of insertion was also investigated . Unlike the related reaction of silylenes with the C–Cl bonds (section ), a radical pathway is much less favorable than direct insertion (Δ G ‡ = 44.1 kcal mol –1 for the radical pathway vs Δ G ‡ = 15.3 kcal mol –1 for the direct insertion).…”